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Volumn , Issue 1, 2006, Pages 121-128

Mixed hydrazido amido/imido complexes of tantalum, hafnium and zirconium: Potential precursors for metal nitride MOCVD

Author keywords

[No Author keywords available]

Indexed keywords

AMINES; CRYSTAL STRUCTURE; DERIVATIVES; HAFNIUM; HYDRAZINE; MASS SPECTROMETRY; NITRIDES; NITROGEN; NUCLEAR MAGNETIC RESONANCE; SCANNING ELECTRON MICROSCOPY; TANTALUM; ZIRCONIUM;

EID: 33645524184     PISSN: 14779226     EISSN: 14779234     Source Type: Journal    
DOI: 10.1039/b512074h     Document Type: Article
Times cited : (24)

References (34)
  • 5
    • 33645521363 scopus 로고    scopus 로고
    • M. Houssa, Institute of Physics Publishing, Bristol, pp. 17-64
    • M. Ritala, in High-k Gate Dielectrics, ed., M. Houssa, Institute of Physics Publishing, Bristol, 2004, pp. 17-64
    • (2004) High-k Gate Dielectrics, Ed.
    • Ritala In, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.