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Volumn 19, Issue 10, 2009, Pages 1399-1408

Combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a mixed vanadium oxide and vanadium oxynitride thin film

(3) Kafizas, Andreas a Hyett, Geoffrey a Parkin, Ivan P a

a UNIVERSITY COLLEGE LONDON (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CHEMICAL ANALYSIS; CHEMICAL VAPOR DEPOSITION; NITRIDES; OXIDES; OXYGEN; PHASE SPACE METHODS; SCANNING ELECTRON MICROSCOPY; TRANSITION METALS; VANADIUM; VANADIUM ALLOYS; VANADIUM COMPOUNDS; WAVELENGTH DISPERSIVE SPECTROSCOPY; X RAY DIFFRACTION ANALYSIS;

CHEMICAL COMPOSITIONS; CHEMICAL VAPOUR DEPOSITIONS; ELECTRICAL RESISTANCES; FILM THICKNESS; FUNCTIONAL PROPERTIES; MAPPING ANALYSIS; MIXED ANIONS; OXYGEN CONTENTS; OXYNITRIDE; OXYNITRIDE FILMS; PHASE SPACES; RAPID METHODS; SEM; SYSTEMATIC INVESTIGATIONS; VANADIUM OXIDES; WAVELENGTH DISPERSIVE X-RAYS; X-RAY DIFFRACTIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES; XRD;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 61349135760 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/b817429f Document Type: Article

Times cited : (47)

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