Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors

Chemical Vapor Deposition

Volumn 7, Issue 1, 2001, Pages 25-28

  Liu, Xiang ^b   Babcock, Jason R ^a   Lane, Melissa A ^b   Belot, John A ^a   Ott, Andrew W ^b   Metz, Matthew V ^a   Kannewurf, Carl R ^b   Chang, Robert P H ^b   Marks, Tobin J ^a  

^a NORTHWESTERN UNIVERSITY   (United States)

^b Northwestern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039145629     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3862(200101)7:1<25::AID-CVDE25>3.0.CO;2-O     Document Type: Article

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