Stability of TiN films prepared by chemical vapor deposition using tetrakis-dimethylamino titanium

Journal of the Electrochemical Society

Volumn 143, Issue 9, 1996, Pages

  Kim, Do Heyoung ^a   Kim, Jung Ju ^a   Park, Jin W ^a   Kim, Jae J ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA POST TREATMENT; TETRAKIS DIMETHYLAMINO TITANIUM;

CARBON; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; FILMS; PLASMA APPLICATIONS; SEMICONDUCTOR DEVICE MANUFACTURE; STABILITY;

TITANIUM NITRIDE;

EID: 0030246538     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837081     Document Type: Article

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