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Volumn 39, Issue 3 A, 2000, Pages 1299-1302
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Properties of TiN films on heated substrate below 550°C by 50 Hz plasma-enhanced chemical vapor deposition
a b b c d |
Author keywords
Low frequency plasma; Plasma enhanced CVD; Surface hardening material; Thin film deposition; Titanium nitride
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Indexed keywords
CRYSTAL STRUCTURE;
ELECTRIC CONDUCTIVITY OF SOLIDS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SUBSTRATES;
THIN FILMS;
VICKERS HARDNESS TESTING;
X RAY DIFFRACTION ANALYSIS;
LOW FREQUENCY PLASMA;
SUBSTRATE BIAS CIRCUIT;
SURFACE HARDENING MATERIAL;
TITANIUM NITRIDE FILMS;
TITANIUM NITRIDE;
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EID: 0033741923
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.39.1299 Document Type: Article |
Times cited : (4)
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References (16)
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