메뉴 건너뛰기




Volumn 39, Issue 3 A, 2000, Pages 1299-1302

Properties of TiN films on heated substrate below 550°C by 50 Hz plasma-enhanced chemical vapor deposition

Author keywords

Low frequency plasma; Plasma enhanced CVD; Surface hardening material; Thin film deposition; Titanium nitride

Indexed keywords

CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY OF SOLIDS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUBSTRATES; THIN FILMS; VICKERS HARDNESS TESTING; X RAY DIFFRACTION ANALYSIS;

EID: 0033741923     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.1299     Document Type: Article
Times cited : (4)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.