Reactivity of ZrCl4 and HfCl4 with silylamines and thermal decomposition of the compounds [MCl4{NH(R)(SiR′3)}] (M = Zr, Hf, R = tBu, R′ = Me; R = SiR′3 = SiMe3, SiMe2H)

Polyhedron

Volumn 27, Issue 3, 2008, Pages 1041-1046

  Hasan, Plaboni ^a   Potts, Stephen E ^a   Carmalt, Claire J ^a   Palgrave, Robert G ^a   Davies, Hywel O ^b  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b SAFC Hitech   (United Kingdom)

Author keywords

CVD; Hafnium nitride; Thin film; Zirconium nitride

Indexed keywords

EID: 38749087579     PISSN: 02775387     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.poly.2007.11.034     Document Type: Article

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