Metalorganic atomic layer deposition of TiN thin films using TDMAT and NH3

Journal of the Korean Physical Society

Volumn 41, Issue 5, 2002, Pages 739-744

  Kim, Hyo Kyeom ^a   Kim, Ju Youn ^a   Park, Jin Yong ^a   Kim, Yangdo ^a   Kim, Young Do ^a   Jeon, Hyeongtag ^a   Kim, Won Mok ^b  

^a Hanyang University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

Diffusion barrier; MOALD; TDMAT; TiN

Indexed keywords

EID: 0036864538     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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