Reactive DC magnetron deposition of copper nitride films for write-once optical recording

Materials Letters

Volumn 60, Issue 29-30, 2006, Pages 3758-3760

  Ji, Zhenguo ^a   Zhang, Yahong ^a   Yuan, Yuan ^a   Wang, Chao ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

Copper nitride thin films; DC magnetron sputtering; Optical storage; Reflectance; Thermal decomposition

Indexed keywords

GLASS; MAGNETRON SPUTTERING; METALLIC FILMS; NITROGEN; PYROLYSIS; REFLECTION; X RAY DIFFRACTION;

COPPER NITRIDE THIN FILMS; DC MAGNETRON SPUTTERING; OPTICAL STORAGE; WAVELENGTH RANGES;

COPPER COMPOUNDS;

EID: 33750365643     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2006.03.107     Document Type: Article

References (10)

1. Perez A., Melinon P., Dupuis V., Jenson P., et al. J. Phys., D, Appl. Phys. 30 (1997) 709-721
2. Terao N. C. R. Acad. Sci. Paris Ser. B 277 (1973) 595
3. Terada S., Tanaka H., and Kubota K. J. Cryst. Growth 94 (1989) 567
4. Maruyama T., and Morishita T. J. Appl. Phys. 78 (1995) 4104
5. Wang D.Y., Nakamine N., and Hayashi Y. J. Vac. Sci. Technol., A 16 (1998) 2084-2092
6. Asano M., Umeda K., and Tasaki A. Jpn. J. Appl. Phys. 29 (1990) 1985-1986
7. Maya L. J. Vac. Sci. Technol., A 11 (1993) 604-608
8. Liu Z.Q., Wang W.J., Wang T.M., Chao S., and Zheng S.K. Thin Solid Films 325 (1998) 55-59
9. Maruyama T., and Morishita T. Appl. Phys. Lett. (1996) 890-891
10. Yue G.H., and Yan P.X. J. Cryst. Growth 274 (2005) 464-468