Highly conformal thin films of tungsten nitride prepared by atomic layer deposition from a novel precursor

Chemistry of Materials

Volumn 15, Issue 15, 2003, Pages 2969-2976

  Becker, Jill S ^a   Suh, Seigi ^a   Wang, Shenglong ^a   Gordon, Roy G ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONFORMAL COATINGS;

POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VISCOSITY; X RAY DIFFRACTION ANALYSIS;

TUNGSTEN COMPOUNDS;

ALUMINUM; AMMONIA; CARBON; COPPER; GLASS; GOLD; SILICON; STAINLESS STEEL; TUNGSEN NITRIDE; TUNGSTEN DERIVATIVE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL ANALYSIS; CHEMICAL BINDING; CONDUCTANCE; FILM; LOW TEMPERATURE; OXIDATION; ROOM TEMPERATURE; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; SYNTHESIS; VISCOSITY; X RAY DIFFRACTION;

EID: 0042266842     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm021772s     Document Type: Article

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