Atomic-layer chemical-vapor-deposition of tin thin films on Si(100) and Si(111)

Journal of the Korean Physical Society

Volumn 37, Issue 6, 2000, Pages 1045-1050

  Kim, Young Seok ^a   Jeon, Hyeongtag ^a   Kim, Young Do ^a   Kim, Won Mok ^b  

^a Hanyang University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0034347702     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.37.1045     Document Type: Article

References (16)

1. G. I. Grigorov, K. G. Grigorov, M. Stoyanova, J. L. Vignes, J. P. Langeron and P. Denjean, Appl. Phys. A57, 195 (1993).
2. Rama I. Hedge, Appl. Phys. Lett. 62, 2326 (1993).
3. P. C. McIntyre and S. R. Summerfelt, J. Appl. Phys. 82, 4577 (1997).
4. I. Raaijmakers and R. Vrtis, VMIC Conference (1992), p. 260.
5. M. J. Buiting, A. F. Otterloo and A. H. Montree, J. Electrochem. Soc. 138, 500 (1991).
6. A. Intemann and H. Koerner, J. Electrochem. Soc. 140, 3215 (1993).
7. N. Yokoyama, K. Hinode and U Homma, J. Electrochem. Soc. 138, 190 (1991).
8. R. Leutenecker, B. Froschle and P. Ramm, Thin Solid Films 270, 621 (1995).
9. J. C. Hu, T. C. Chang, L. J. Chen, Y. L. Yang and C. Y. Chang, Thin Solid Films 332, 423 (1998).
10. T. Suntola, Thin Solid Films 216, 84 (1992).
11. C. H. L. Goodman and M. V. Pessa, J. Appl. Phys. 60, R65 (1986).
12. L. Niinisto and M. Leskela, Thin Solid Films 225, 130 (1993).
13. J. W. Uhm, S. S. Lee, J. W. Lee, T. H. Cha, K. S. Yi, Y. D. Kim and H. Jeon, J. Korean Phys. Soc. 35, 765 (1999).
14. H. Jeon, H. B. Choi and T. H. Ahn, J. Koeran Phys. Soc. 29, 781 (1996).
15. S. Haukka, E. L. Lakomaa and T. Suntola, Apply. Surf. Sci. 82/83, 548 (1994).
16. Rama I. Hegde, Robert W. Fiordalice, Edward O. Travis and Philip J. Tobin, J. Vac. Sci.Technol. B11, 1287 (1993).