MOCVD of the cubic zinc nitride phase, Zn3N2, using Zn[N(SiMc3)2]2 and ammonia as precursors

Chemical Vapor Deposition

Volumn 11, Issue 10, 2005, Pages 409-414

  Maile, Eva ^a   Fischer, Roland A ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

MOCVD; Thin films; Zinc nitride

Indexed keywords

AMMONIA; COATING TECHNIQUES; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; POLYCRYSTALLINE MATERIALS; ZINC COMPOUNDS;

FILM MORPHOLOGY; POLYCRYSTALLINE FILMS; PRECURSORS; REACTIVE GAS;

THIN FILMS;

EID: 27744497609     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200506383     Document Type: Article

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