Kinetics and microstructure of laser chemical vapor deposition of titanium nitride

Acta Materialia

Volumn 55, Issue 10, 2007, Pages 3623-3631

  Egland, K M ^a   Mazumder, J ^b  

^a CATERPILLAR INC   (United States)

^b UNIVERSITY OF MICHIGAN   (United States)

Author keywords

AES; Film characteristics; Kinetics of LCVD; LCVD; Stochiometry

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FLUORESCENCE; LASERS; MICROSTRUCTURE; PYROMETRY; STOICHIOMETRY;

ATOMIC NUMBER DENSITY; GROWTH RATES; LASER INDUCED FLUORESCENCE (LIF); SUBSTOICHIOMETRIC FILMS;

TITANIUM NITRIDE;

EID: 34247645523     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2007.02.013     Document Type: Article

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