Microstructure and preferred orientation of titanium nitride films prepared by laser CVD

Materials Transactions

Volumn 50, Issue 8, 2009, Pages 2028-2034

  Gong, Yansheng ^a   Tu, Rong ^a   Goto, Takashi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Laser chemical vapor deposition (lcvd); Microstructure; Preferred orientation; Tetrakis diethylamide titanium (tdeat); Tinx films

Indexed keywords

DEPOSITION CONDITIONS; LASER CHEMICAL VAPOR DEPOSITION; LASER CHEMICAL VAPOR DEPOSITION (LCVD); LASER CVD; LASER POWER; PREFERRED ORIENTATION; PREFERRED ORIENTATIONS; SOURCE MATERIAL; TETRAKIS; TETRAKIS-DIETHYLAMIDE-TITANIUM (TDEAT); TITANIUM NITRIDE FILMS; TOTAL GAS PRESSURE;

CHEMICAL VAPOR DEPOSITION; FILM PREPARATION; LASERS; TEXTURES; TIN; TITANIUM; VAPORS;

TITANIUM NITRIDE;

EID: 70350093953     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.M2009101     Document Type: Article

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