Preparation of FeN thin films by chemical vapor deposition using a chloride source

Materials Letters

Volumn 42, Issue 6, 2000, Pages 380-382

  Takahashi, Naoyuki ^a   Toda, Yoshihiro ^a   Nakamura, Takato ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; FILM PREPARATION; IRON COMPOUNDS; MAGNETIC PROPERTIES; MAGNETIC VARIABLES MEASUREMENT; MAGNETIZATION; NITRIDES; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

CHLORIDE SOURCE; GROWTH RATE; IRON NITRIDE; SATURATION MAGNETIZATION; X RAY DIFFRACTOGRAMS;

THIN FILMS;

EID: 0034159141     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(99)00214-1     Document Type: Article

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