Self-assembling and self-limiting monolayer deposition

European Physical Journal D

Volumn 68, Issue 2, 2014, Pages

  Foest, Rüdiger ^a   Schmidt, Martin ^a   Gargouri, Hassan ^b  

^a LEIBNIZ INSTITUTE FOR PLASMA SCIENCE AND TECHNOLOGY   (Germany)

^b SENTECH INSTRUMENTS GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; FILM GROWTH; LANGMUIR BLODGETT FILMS; MOLECULES; THIN FILM TRANSISTORS;

FILM-DEPOSITION PROCESS; LAYER GROWTH; MICRO ELECTRONICS; MONOLAYER DEPOSITION; PROPERTY; REVIEW PAPERS; SELF-ASSEMBLING; SPATIAL ORDERING; THIN-FILM DEPOSITIONS; ULTRA-THIN FILM;

ULTRATHIN FILMS;

EID: 84897805540     PISSN: 14346060     EISSN: 14346079     Source Type: Journal    
DOI: 10.1140/epjd/e2013-40420-y     Document Type: Article

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