Growth, structure, and tribological behavior of atomic layer-deposited tungsten disulphide solid lubricant coatings with applications to MEMS

Acta Materialia

Volumn 54, Issue 18, 2006, Pages 4731-4743

  Scharf, T W ^a   Prasad, S V ^a   Dugger, M T ^a   Kotula, P G ^a   Goeke, R S ^a   Grubbs, R K ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Atomic layer deposition (ALD); Crystal growth; High resolution electron microscopy (HREM); Internal friction; Wear

Indexed keywords

ADSORPTION; COMPUTER SOFTWARE; CRYSTAL GROWTH; CRYSTALLINE MATERIALS; HIGH RESOLUTION ELECTRON MICROSCOPY; INTERNAL FRICTION; MICROELECTROMECHANICAL DEVICES; NANOSTRUCTURED MATERIALS; POLYSILICON; SHEAR STRESS; STAINLESS STEEL; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN COMPOUNDS; WEAR OF MATERIALS; X RAY DIFFRACTION ANALYSIS;

ATOMIC LAYER DEPOSITION (ALD); COATING CONFORMALITY; DIETHYL ZINC CATALYST; VAPOR PHASE REACTIONS;

SOLID LUBRICANTS;

EID: 33748972674     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2006.06.009     Document Type: Article

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