Self-limiting growth of anatase TiO2: A comparison of two deposition techniques

Thin Solid Films

Volumn 518, Issue 23, 2010, Pages 6733-6737

  Kubala, Nicholas G ^a   Wolden, Colin A ^a  

^a Department of Geology and Geological Engineering   (United States)

Author keywords

Anatase; Atomic layer deposition; Fourier transform infrared spectroscopy; Plasma enhanced chemical vapor deposition; Self limiting growth; Titanium oxide; X ray diffraction

Indexed keywords

ANATASE; ANATASE FILMS; ANATASE TIO; ATOMIC LAYER; COMPLEX TOPOGRAPHIES; CONFORMALITY; DEPOSITION KINETICS; DEPOSITION TECHNIQUE; LOW TEMPERATURES; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; PROCESS CONDITION; PULSED PLASMA; SELF-LIMITING GROWTH; SUBSTRATE TEMPERATURE; TITANIUM DIOXIDE THIN FILM;

ATOMIC LAYER DEPOSITION; ATOMIC SPECTROSCOPY; ATOMS; DIFFRACTION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; MOLECULAR OXYGEN; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; VAPOR DEPOSITION; X RAY DIFFRACTION;

DEPOSITION;

EID: 77956229495     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.05.128     Document Type: Article

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