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Volumn 13, Issue 6, 2010, Pages

Ozone-based metal oxide atomic layer deposition: Impact of N2 / O2 supply ratio in ozone generation

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC BARRIER DISCHARGES; FLOW RATIOS; GROWTH PER CYCLE; HOT WALL; METAL OXIDES; METAL PRECURSOR; NEGATIVE IMPACTS; OZONE GENERATION; TEMPERATURE WINDOW;

EID: 77951179923     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3355207     Document Type: Article
Times cited : (17)

References (27)
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  • 3
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  • 7
    • 0033283581 scopus 로고    scopus 로고
    • Analysis of ozone generation from air in silent discharge
    • DOI 10.1088/0022-3727/32/23/309
    • J. Kitayama and M. Kuzumoto, J. Phys. D: Appl. Phys. JPAPBE 0022-3727, 32, 3032 (1999). 10.1088/0022-3727/32/23/309 (Pubitemid 32082256)
    • (1999) Journal of Physics D: Applied Physics , vol.32 , Issue.23 , pp. 3032-3040
    • Kitayama, J.1    Kuzumoto, M.2
  • 15
    • 33748258535 scopus 로고    scopus 로고
    • Ozone-based atomic layer deposition of alumina from TMA: Growth, morphology, and reaction mechanism
    • DOI 10.1021/cm0608903
    • S. D. Elliott, G. Scarel, C. Wiemer, M. Fanciulli, and G. Pavia, Chem. Mater. CMATEX 0897-4756, 18, 3764 (2006). 10.1021/cm0608903 (Pubitemid 44318557)
    • (2006) Chemistry of Materials , vol.18 , Issue.16 , pp. 3764-3773
    • Elliott, S.D.1    Scarel, G.2    Wiemer, C.3    Fanciulli, M.4    Pavia, G.5
  • 17
    • 4344595811 scopus 로고    scopus 로고
    • JAPIAU 0021-8979,. 10.1063/1.1769090
    • S. K. Kim and C. S. Hwang, J. Appl. Phys. JAPIAU 0021-8979, 96, 2323 (2004). 10.1063/1.1769090
    • (2004) J. Appl. Phys. , vol.96 , pp. 2323
    • Kim, S.K.1    Hwang, C.S.2
  • 22
    • 0142075189 scopus 로고    scopus 로고
    • THSFAP 0040-6090,. 10.1016/S0040-6090(03)01101-5
    • O. Nilsen, H. Fjellvag, and A. Kjekshus, Thin Solid Films THSFAP 0040-6090, 444, 44 (2003). 10.1016/S0040-6090(03)01101-5
    • (2003) Thin Solid Films , vol.444 , pp. 44
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.