Controlling the crystallinity and roughness of atomic layer deposited titanium dioxide films

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 9, 2011, Pages 8101-8107

  Puurunen, Riikka L ^a   Sajavaara, Timo ^b   Santala, Eero ^c   Miikkulainen, Ville ^c   Saukkonen, Tapio ^d   Laitinen, Mikko ^b   Leskelä, Markku ^c  

^a VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

^b UNIVERSITY OF JYVÄSKYLÄ   (Finland)

^c UNIVERSITY OF HELSINKI   (Finland)

^d AALTO UNIVERSITY   (Finland)

Author keywords

Anatase; Atomic layer deposition; Roughness; TiO 2

Indexed keywords

ANATASE TIO; ATOMIC LAYER; ATOMIC LAYER DEPOSITED; CRYSTAL DIAMETER; CRYSTALLINITIES; CRYSTALLIZATION BEHAVIOURS; DEPOSITION TEMPERATURES; TIO; TITANIUM DIOXIDE FILMS;

ADHESION; ATOMIC LAYER DEPOSITION; SILICON; SILICON COMPOUNDS; SUBSTRATES; SURFACE ROUGHNESS; THICKNESS MEASUREMENT;

TITANIUM DIOXIDE;

EID: 84856846507     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2011.5060     Document Type: Conference Paper

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