Perspective on the development of microplasma technology: The role of oxygen in downstream microwave plasma

Contributions to Plasma Physics

Volumn 47, Issue 1-2, 2007, Pages 89-95

  Wu, Y T ^a   Liao, J D ^a   Weng, C C ^a   Wang, M C ^a   Chang, J E ^a   Chen, C H ^b   Zharnikov, M ^c  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^c UNIVERSITY OF HEIDELBERG   (Germany)

Author keywords

Downstream plasma; Plasma reactivity; Self assembled monolayers

Indexed keywords

CHEMICAL MODIFICATION; NITROGEN PLASMA; PLASMA APPLICATIONS; REACTION RATES; SELF ASSEMBLED MONOLAYERS; ULTRATHIN FILMS; WETTING;

ALKANETHIOLATES; DOWN-STREAM; DOWN-STREAM PLASMAS; GOLD SUBSTRATES; MICRO-PLASMAS; MICROWAVE PLASMA; PLASMA REACTIVITY; PLASMA-INDUCED; TEST SYSTEMS; ULTRATHIN ORGANIC FILMS;

OXYGEN;

EID: 33947178330     PISSN: 08631042     EISSN: 15213986     Source Type: Journal    
DOI: 10.1002/ctpp.200710013     Document Type: Conference Paper

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