Nucleation and growth of Pt atomic layer deposition on Al2O 3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma

Journal of Applied Physics

Volumn 109, Issue 8, 2011, Pages

  Baker, L ^a   Cavanagh, A S ^a   Seghete, D ^a   George, S M ^a   MacKus, A J M ^b   Kessels, W M M ^b   Liu, Z Y ^c   Wagner, F T ^c  

^a UNIVERSITY OF COLORADO   (United States)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c GENERAL MOTORS CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

A-DENSITY; FILM DENSITY; LINEAR GROWTH; NUCLEATION AND GROWTH; NUCLEATION RATE; PLASMA PARAMETER; SEM IMAGE; STEADY STATE; TRIMETHYL; X RAY REFLECTIVITY;

ALUMINUM; ATOMIC LAYER DEPOSITION; FILM GROWTH; GROWTH RATE; NUCLEATION; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

PLATINUM;

EID: 79955727920     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3555091     Document Type: Article

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