Nucleation period, surface roughness, and oscillations in mass gain per cycle during W atomic layer deposition on Al2 O3

Journal of Applied Physics

Volumn 105, Issue 7, 2009, Pages

  Wind, R W ^a,c   Fabreguette, F H ^a,d   Sechrist, Z A ^a,e   George, S M ^a,b  

^a UNIVERSITY OF COLORADO   (United States)

^b UCB 450   (United States)

^c Synkera Technologies   (United States)

^d MICRON TECHNOLOGY INC   (United States)

^e NAVAL AIR WARFARE CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPES; ATOMIC LAYERS; ATOMIC-LAYER DEPOSITIONS; ENHANCED GROWTHS; EX-SITU; IN-SITU; INHIBITED GROWTHS; ISLAND GROWTHS; ISLAND NUCLEATIONS; LINEAR DEPENDENCES; LOCAL MAXIMUM; LOCAL MINIMUMS; MASS-GAINS; NANO-LAMINATES; NUCLEATION AND GROWTHS; PERIODIC OSCILLATIONS; RAPID NUCLEATIONS; REACTANT EXPOSURES; RMS ROUGHNESS; ROOT-MEAN-SQUARE ROUGHNESS; STEADY STATE;

ALUMINA; ATOMS; COALESCENCE; HYDROXYLATION; MOTION ESTIMATION; NUCLEATION; OXIDE MINERALS; OZONE WATER TREATMENT; PHOTORESISTS; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; SURFACE PROPERTIES; SURFACE ROUGHNESS;

ATOMIC LAYER DEPOSITION;

EID: 65249131082     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3103254     Document Type: Article

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