High-resolution X-ray photoelectron spectroscopy in studies of self-assembled organic monolayers

Journal of Electron Spectroscopy and Related Phenomena

Volumn 178-179, Issue C, 2010, Pages 380-393

  Zharnikov, Michael ^a  

^a UNIVERSITY OF HEIDELBERG   (Germany)

Author keywords

Chemical shift; Electrostatic effects; High resolution X ray photoelectron spectroscopy; Self assembled monolayers; X ray induced damage

Indexed keywords

CALIBRATION PROCEDURE; CHALCOGENS; ELECTROSTATIC EFFECT; GENERAL ASPECTS; HIGH RESOLUTION; HIGH-ENERGY RESOLUTION; RECENT PROGRESS; REFERENCE DATA; SAM SYSTEM; SAMS; SELF-ASSEMBLED ORGANIC MONOLAYERS; SPECIFIC EFFECTS; X-RAY INDUCED DAMAGE; XPS;

CHEMICAL SHIFT; ELECTRONS; ELECTROSTATICS; EMISSION SPECTROSCOPY; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; SELF ASSEMBLED MONOLAYERS; X RAYS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 77951022225     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2009.05.008     Document Type: Article

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