SCOPUS 정보 검색 플랫폼

Volumn 93, Issue 12, 2008, Pages

The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC PHYSICS; ATOMS; HAFNIUM; HAFNIUM COMPOUNDS; NONMETALS; OXIDES; OXYGEN; PLASMA DEPOSITION; PLASMAS; PULSED LASER DEPOSITION;

ATOMIC LAYER DEPOSITIONS; HAFNIUM OXIDE; OXYGEN PLASMAS; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; REACTION PATHWAYS;

ATOMIC LAYER DEPOSITION;

EID: 52949150386 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.2991288 Document Type: Article

Times cited : (20)

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