메뉴 건너뛰기




Volumn , Issue , 2012, Pages 193-225

Nanopatterning by Area-Selective Atomic Layer Deposition

Author keywords

Area selective atomic layer deposition; Microcontact printing; Nanopatterns; Octadecyltrichlorosilane; Self assembled monolayers

Indexed keywords


EID: 84869047192     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1002/9783527639915.ch9     Document Type: Chapter
Times cited : (44)

References (132)
  • 1
    • 0942267575 scopus 로고    scopus 로고
    • Atomic layer deposition of metal and nitride thin films: current research efforts and applications for semiconductor device processing
    • Kim, H. (2003) Atomic layer deposition of metal and nitride thin films: current research efforts and applications for semiconductor device processing. J. Vac. Sci. Technol. B, 21 (6), 2231.
    • (2003) J. Vac. Sci. Technol. B , vol.21 , Issue.6 , pp. 2231
    • Kim, H.1    Kim, H.2
  • 2
    • 75649140552 scopus 로고    scopus 로고
    • Atomic layer deposition: an overview
    • George, S.M. (2009) Atomic layer deposition: an overview. Chem. Rev., 110 (1), 111.
    • (2009) Chem. Rev. , vol.110 , Issue.1 , pp. 111
    • George, S.M.1    George, S.M.2
  • 4
    • 0344667722 scopus 로고    scopus 로고
    • Atomic layer deposition chemistry: recent developments and future challenges
    • Leskelä, M. and Ritala, M. (2003) Atomic layer deposition chemistry: recent developments and future challenges. Angew. Chem., Int. Ed.,(45), 5548.
    • (2003) Angew. Chem., Int. Ed , Issue.45 , pp. 5548
    • Leskelä, M.1    Ritala, M.2    Leskelä, M.3    Ritala, M.4
  • 6
    • 0345979435 scopus 로고    scopus 로고
    • Formation and structure of self-assembled monolayers
    • Ulman, A. (1996) Formation and structure of self-assembled monolayers. Chem. Rev., 96 (4), 1533.
    • (1996) Chem. Rev. , vol.96 , Issue.4 , pp. 1533
    • Ulman, A.1    Ulman, A.2
  • 7
    • 0034314223 scopus 로고    scopus 로고
    • Structure and growth of self-assembling monolayers
    • Schreiber, F. (2000) Structure and growth of self-assembling monolayers. Prog. Surf. Sci., 65 (5-8), 151.
    • (2000) Prog. Surf. Sci , vol.65 , Issue.5-8 , pp. 151
    • Schreiber, F.1
  • 8
    • 0021788046 scopus 로고
    • Spontaneously organized molecular assemblies2. Quantitative infrared spectroscopic determination of equilibrium structures of solutionadsorbed n-alkanoic acids on an oxidized aluminum surface
    • Allara, D.L. and Nuzzo, R.G. (1985) Spontaneously organized molecular assemblies. 2. Quantitative infrared spectroscopic determination of equilibrium structures of solutionadsorbed n-alkanoic acids on an oxidized aluminum surface. Langmuir,(1), 52.
    • (1985) Langmuir , vol.1 , pp. 52
    • Allara, D.L.1    Nuzzo, R.G.2
  • 9
    • 0021788596 scopus 로고
    • Spontaneously organized molecular assemblies. 1. Formation, dynamics, and physical properties of n-alkanoic acids adsorbed from solution on an oxidized aluminum surface
    • Allara, D.L. and Nuzzo, R.G. (1985) Spontaneously organized molecular assemblies. 1. Formation, dynamics, and physical properties of n-alkanoic acids adsorbed from solution on an oxidized aluminum surface. Langmuir,(1), 45.
    • (1985) Langmuir , vol.1 , pp. 45
    • Allara, D.L.1    Nuzzo, R.G.2
  • 12
    • 0001130997 scopus 로고
    • Structural comparison of self-assembled monolayers of n-alkanoic acids on the surfaces of silver, copper, and aluminum
    • Tao, Y.T. (1993) Structural comparison of self-assembled monolayers of n-alkanoic acids on the surfaces of silver, copper, and aluminum. J. Am. Chem. Soc., 115 (10), 4350.
    • (1993) J. Am. Chem. Soc. , vol.115 , Issue.10 , pp. 4350
    • Tao, Y.T.1    Tao, Y.T.2
  • 13
    • 0009054084 scopus 로고    scopus 로고
    • The self-assembly mechanism of alkanethiols on Au(111)
    • Poirier, G.E. and Pylant, E.D. (1996) The self-assembly mechanism of alkanethiols on Au(111). Science, 272 (5265), 1145.
    • (1996) Science , vol.272 , Issue.5265 , pp. 1145
    • Poirier, G.E.1    Pylant, E.D.2    Poirier, G.E.3    Pylant, E.D.4
  • 17
    • 11644265471 scopus 로고
    • ω-Terminated alkanethiolate monolayers on surfaces of copper, silver, and gold have similar wettabilities
    • Laibinis, P.E. and Whitesides, G.M. (1992) ω-Terminated alkanethiolate monolayers on surfaces of copper, silver, and gold have similar wettabilities. J. Am. Chem. Soc., 114 (6), 1990.
    • (1992) J. Am. Chem. Soc. , vol.114 , Issue.6 , pp. 1990
    • Laibinis, P.E.1    Whitesides, G.M.2    Laibinis, P.E.3    Whitesides, G.M.4
  • 18
    • 0000693009 scopus 로고
    • Self-assembled monolayers of n-alkanethiolates on copper are barrier films that protect the metal against oxidation by air
    • Laibinis, P.E. and Whitesides, G.M. (1992) Self-assembled monolayers of n-alkanethiolates on copper are barrier films that protect the metal against oxidation by air. J. Am. Chem. Soc., 114 (23), 9022.
    • (1992) J. Am. Chem. Soc. , vol.114 , Issue.23 , pp. 9022
    • Laibinis, P.E.1    Whitesides, G.M.2    Laibinis, P.E.3    Whitesides, G.M.4
  • 19
    • 0000479736 scopus 로고
    • Self-assembled monolayer coatings on nanosized magnetic particles using 16-mercaptohexadecanoic acid
    • Liu, Q. and Xu, Z. (1995) Self-assembled monolayer coatings on nanosized magnetic particles using 16-mercaptohexadecanoic acid. Langmuir,(12), 4617.
    • (1995) Langmuir , Issue.12 , pp. 4617
    • Liu, Q.1    Xu, Z.2
  • 24
    • 0001121971 scopus 로고
    • Evidence for a unique chain organization in long-chain silane monolayers deposited on two widely different solid substrates
    • Allara, D.L., Parikh, A.N., and Rondelez, F. (1995) Evidence for a unique chain organization in long-chain silane monolayers deposited on two widely different solid substrates. Langmuir, (7), 2357.
    • (1995) Langmuir , Issue.7 , pp. 2357
    • Allara, D.L.1    Parikh, A.N.2    Rondelez, F.3    Allara, D.L.4    Parikh, A.N.5    Rondelez, F.6
  • 26
    • 0742303914 scopus 로고
    • Organized monolayers by adsorption. 1. Formation and structure of oleophobic mixed monolayers on solid surfaces
    • Sagiv, J. (1980) Organized monolayers by adsorption. 1. Formation and structure of oleophobic mixed monolayers on solid surfaces. J. Am. Chem. Soc., 102 (1), 92.
    • (1980) J. Am. Chem. Soc. , vol.102 , Issue.1 , pp. 92
    • Sagiv, J.1    Sagiv, J.2
  • 27
    • 0021498208 scopus 로고
    • On the formation and structure of selfassemblingmonolayers. II.Acomparative study of Langmuir-Blodgett and adsorbed films using ellipsometry and IR reflection-absorption spectroscopy
    • Gun, J., Iscovici, R., and Sagiv, J. (1984)On the formation and structure of selfassemblingmonolayers. II.Acomparative study of Langmuir-Blodgett and adsorbed films using ellipsometry and IR reflection-absorption spectroscopy. J. Colloid Interface Sci., 101 (1), 201.
    • (1984) J. Colloid Interface Sci , vol.101 , Issue.1 , pp. 201
    • Gun, J.1    Iscovici, R.2    Sagiv, J.3
  • 28
    • 2842512057 scopus 로고
    • Incorporation of phenoxy groups in self-assembled monolayers of trichlorosilane derivatives Effects on film thickness, wettability, and molecular orientation
    • Tillman, N., Ulman, A., Schildkraut, J.S., and Penner, T.L. (1988) Incorporation of phenoxy groups in self-assembled monolayers of trichlorosilane derivatives. Effects on film thickness, wettability, and molecular orientation. J. Am. Chem. Soc., 110 (18), 6136.
    • (1988) J. Am. Chem. Soc , vol.110 , Issue.18 , pp. 6136
    • Tillman, N.1    Ulman, A.2    Schildkraut, J.S.3    Penner, T.L.4    Tillman, N.5    Ulman, A.6    Schildkraut, J.S.7    Penner, T.L.8
  • 29
    • 0001011770 scopus 로고
    • Naphthalene chromophore tethered in the constrained environment of a selfassembled monolayer
    • Mathauer, K. and Frank, C.W. (1993) Naphthalene chromophore tethered in the constrained environment of a selfassembled monolayer. Langmuir, 9 (11), 3002.
    • (1993) Langmuir , vol.9 , Issue.11 , pp. 3002
    • Mathauer, K.1    Frank, C.W.2    Mathauer, K.3    Frank, C.W.4
  • 30
    • 0027591239 scopus 로고
    • Synthesis and characterization of selfassembled hydrophobic monolayer coatings on silica colloids
    • Brandriss, S. and Margel, S. (1993) Synthesis and characterization of selfassembled hydrophobic monolayer coatings on silica colloids. Langmuir,(5), 1232.
    • (1993) Langmuir , Issue.5 , pp. 1232
    • Brandriss, S.1    Margel, S.2
  • 31
    • 0000156089 scopus 로고
    • Formation of an organized monolayer by solution adsorption of octadecyltrichlorosilane on gold: electrochemical properties and structural characterization
    • Finklea, H.O., Robinson, L.R., Blackburn, A., Richter, B., Allara, D., and Bright, T. (1986) Formation of an organized monolayer by solution adsorption of octadecyltrichlorosilane on gold: electrochemical properties and structural characterization. Langmuir,(2), 239.
    • (1986) Langmuir , Issue.2 , pp. 239
    • Finklea, H.O.1    Robinson, L.R.2    Blackburn, A.3    Richter, B.4    Allara, D.5    Bright, T.6
  • 34
    • 1842478072 scopus 로고    scopus 로고
    • Selective atomic layer deposition of titanium oxide on patterned self-assembled monolayers formed by microcontact printing
    • Park, M.H., Jang, Y.J., Sung-Suh, H.M., and Sung, M.M. (2004) Selective atomic layer deposition of titanium oxide on patterned self-assembled monolayers formed by microcontact printing. Langmuir, 20 (6), 2257.
    • (2004) Langmuir , vol.20 , Issue.6 , pp. 2257
    • Park, M.H.1    Jang, Y.J.2    Sung-Suh, H.M.3    Sung, M.M.4    Park, M.H.5    Jang, Y.J.6    Sung-Suh, H.M.7    Sung, M.M.8
  • 36
    • 0032499551 scopus 로고    scopus 로고
    • Corrosion passivation of gold by nalkanethiol self-assembled monolayers: effect of chain length and end group
    • Zamborini, F.P. and Crooks, R.M. (1998) Corrosion passivation of gold by nalkanethiol self-assembled monolayers: effect of chain length and end group. Langmuir, 14 (12), 3279.
    • (1998) Langmuir , vol.14 , Issue.12 , pp. 3279
    • Zamborini, F.P.1    Crooks, R.M.2    Zamborini, F.P.3    Crooks, R.M.4
  • 38
    • 74249087013 scopus 로고    scopus 로고
    • Effects of surface functionalization on titanium dioxide atomic layer deposition on Ge surfaces
    • Ardalan, P., Musgrave, C., and Bent, S. (2009) Effects of surface functionalization on titanium dioxide atomic layer deposition on Ge surfaces. ECS Trans., 25 (4), 131.
    • (2009) ECS Trans. , vol.25 , Issue.4 , pp. 131
    • Ardalan, P.1    Musgrave, C.2    Bent, S.3    Ardalan, P.4    Musgrave, C.5    Bent, S.6
  • 44
    • 33644959310 scopus 로고    scopus 로고
    • Contact area lithography (CAL): a new approach to direct formation of nanometric chemical patterns
    • Bae, C., Shin, H., Moon, J., and Sung, M.M. (2006) Contact area lithography (CAL): a new approach to direct formation of nanometric chemical patterns. Chem. Mater., 18 (5), 1085.
    • (2006) Chem. Mater. , vol.18 , Issue.5 , pp. 1085
    • Bae, C.1    Shin, H.2    Moon, J.3    Sung, M.M.4    Bae, C.5    Shin, H.6    Moon, J.7    Sung, M.M.8
  • 45
    • 2942523964 scopus 로고    scopus 로고
    • Self-assembled monolayer resist for atomic layer deposition of HfO and ZrO high-k gate dielectrics
    • Chen, R., Kim, H., McIntyre, P.C., and Bent, S.F. (2004) Self-assembled monolayer resist for atomic layer deposition of HfO and ZrO high-k gate dielectrics. Appl. Phys. Lett., 84, 4017.
    • (2004) Appl. Phys. Lett , vol.84 , pp. 4017
    • Chen, R.1    Kim, H.2    McIntyre, P.C.3    Bent, S.F.4
  • 46
    • 0347760141 scopus 로고    scopus 로고
    • A new patterning method using photocatalytic lithography and selective atomic layer deposition
    • Lee, J.P. and Sung, M.M. (2004) A new patterning method using photocatalytic lithography and selective atomic layer deposition. J. Am. Chem. Soc., 126 (1), 28.
    • (2004) J. Am. Chem. Soc , vol.126 , Issue.1 , pp. 28
    • Lee, J.P.1    Sung, M.M.2    Lee, J.P.3    Sung, M.M.4
  • 47
    • 68049139055 scopus 로고    scopus 로고
    • Areaselective atomic layer deposition using self-assembled monolayer and scanning probe lithography
    • Lee, W. and Prinz, F.B. (2009) Areaselective atomic layer deposition using self-assembled monolayer and scanning probe lithography. J. Electrochem. Soc., 156 (9), G125.
    • (2009) J. Electrochem. Soc , vol.156 , Issue.9
    • Lee, W.1    Prinz, F.B.2    Lee, W.3    Prinz, F.B.4
  • 48
    • 34547700860 scopus 로고    scopus 로고
    • Spatial control over atomic layer deposition using microcontact-printed resists
    • Jiang, X.R., Chen, R., and Bent, S.F. (2007) Spatial control over atomic layer deposition using microcontact-printed resists. Surf. Coat. Technol., 201 (22-23), 8799.
    • (2007) Surf. Coat. Technol , vol.201 , Issue.22-23 , pp. 8799
    • Jiang, X.R.1    Chen, R.2    Bent, S.F.3
  • 49
    • 33646543320 scopus 로고    scopus 로고
    • Chemistry for positive pattern transfer using areaselective atomic layer deposition
    • Chen, R. and Bent, S.F. (2006) Chemistry for positive pattern transfer using areaselective atomic layer deposition. Adv. Mater., 18 (8), 1086.
    • (2006) Adv. Mater , vol.18 , Issue.8 , pp. 1086
    • Chen, R.1    Bent, S.F.2    Chen, R.3    Bent, S.F.4
  • 50
    • 33847222671 scopus 로고    scopus 로고
    • ALD resist formed by vapor-deposited self-assembled monolayers
    • Hong, J., Porter, D.W., Sreenivasan, R., McIntyre, P.C., and Bent, S.F. (2007) ALD resist formed by vapor-deposited self-assembled monolayers. Langmuir,(3), 1160.
    • (2007) Langmuir , Issue.3 , pp. 1160
    • Hong, J.1    Porter, D.W.2    Sreenivasan, R.3    McIntyre, P.C.4    Bent, S.F.5
  • 56
    • 35548989676 scopus 로고    scopus 로고
    • Areaselective atomic layer deposition of platinum on YSZ substrates using microcontact printed SAMs
    • Jiang, X. and Bent, S.F. (2007) Areaselective atomic layer deposition of platinum on YSZ substrates using microcontact printed SAMs. J. Electrochem. Soc., 154 (12), D648.
    • (2007) J. Electrochem. Soc , vol.154 , Issue.12
    • Jiang, X.1    Bent, S.F.2    Jiang, X.3    Bent, S.F.4
  • 58
    • 18644382518 scopus 로고    scopus 로고
    • Microcontact patterning of ruthenium gate electrodes by selective area atomic layer deposition
    • Park, K.J., Doub, J.M., Gougousi, T., and Parsons, G.N. (2005) Microcontact patterning of ruthenium gate electrodes by selective area atomic layer deposition. Appl. Phys. Lett., 86, 051903.
    • (2005) Appl. Phys. Lett , vol.86 , pp. 051903
    • Park, K.J.1    Doub, J.M.2    Gougousi, T.3    Parsons, G.N.4
  • 64
    • 33748270709 scopus 로고    scopus 로고
    • Highly stable monolayer resists for atomic layer deposition on germanium and silicon
    • Chen, R. and Bent, S.F. (2006) Highly stable monolayer resists for atomic layer deposition on germanium and silicon. Chem. Mater., 18 (16), 3733.
    • (2006) Chem. Mater , vol.18 , Issue.16 , pp. 3733
    • Chen, R.1    Bent, S.F.2    Chen, R.3    Bent, S.F.4
  • 66
    • 63249132603 scopus 로고    scopus 로고
    • Atomic layer deposition of aluminum oxide on carboxylic acid-terminated selfassembled monolayers
    • Li, M., Dai, M., and Chabal, Y.J. (2009) Atomic layer deposition of aluminum oxide on carboxylic acid-terminated selfassembled monolayers. Langmuir, 25 (4), 1911.
    • (2009) Langmuir , vol.25 , Issue.4 , pp. 1911
    • Li, M.1    Dai, M.2    Chabal, Y.J.3    Li, M.4    Dai, M.5    Chabal, Y.J.6
  • 67
    • 31444449925 scopus 로고    scopus 로고
    • Ab initio calculations of the reaction mechanisms for metal-nitride deposition from organo-metallic precursors onto functionalized selfassembled monolayers
    • Haran, M., Engstrom, J.R., and Clancy, P. (2006) Ab initio calculations of the reaction mechanisms for metal-nitride deposition from organo-metallic precursors onto functionalized selfassembled monolayers. J. Am. Chem. Soc., 128 (3), 836.
    • (2006) J. Am. Chem. Soc , vol.128 , Issue.3 , pp. 836
    • Haran, M.1    Engstrom, J.R.2    Clancy, P.3    Haran, M.4    Engstrom, J.R.5    Clancy, P.6
  • 69
    • 70449657415 scopus 로고    scopus 로고
    • Areaselective ALD with soft lithographic methods: using self-assembled monolayers to direct film deposition
    • Jiang, X. and Bent, S.F. (2009) Areaselective ALD with soft lithographic methods: using self-assembled monolayers to direct film deposition. J. Phys. Chem. C, 113 (41), 17613.
    • (2009) J. Phys. Chem. C , vol.113 , Issue.41 , pp. 17613
    • Jiang, X.1    Bent, S.F.2    Jiang, X.3    Bent, S.F.4
  • 70
    • 33644804506 scopus 로고    scopus 로고
    • 2 surface: contact angle, AFM, FTIR and XPS analysis
    • 2 surface: contact angle, AFM, FTIR and XPS analysis. Surf. Interface Anal., 38 (3), 158.
    • (2006) Surf. Interface Anal , vol.38 , Issue.3 , pp. 158
    • Mirji, S.A.1    Mirji, S.A.2
  • 76
    • 34648829841 scopus 로고    scopus 로고
    • Transport behavior of atomic layer deposition precursors through polymer masking layers: influence on area selective atomic layer deposition
    • Sinha, A., Hess, D.W., and Henderson, C.L. (2007) Transport behavior of atomic layer deposition precursors through polymer masking layers: influence on area selective atomic layer deposition. J. Vac. Sci. Technol. B, 25 (5), 1721.
    • (2007) J. Vac. Sci. Technol. B , vol.25 , Issue.5 , pp. 1721
    • Sinha, A.1    Hess, D.W.2    Henderson, C.L.3    Sinha, A.4    Hess, D.W.5    Henderson, C.L.6
  • 79
    • 33748684149 scopus 로고    scopus 로고
    • Atop surface imaging method using area selective ALD on chemically amplified polymer photoresist films
    • Sinha, A., Hess, D.W., and Henderson, C.L. (2006)Atop surface imaging method using area selective ALD on chemically amplified polymer photoresist films. Electrochem. Solid-State Lett., 9, G330.
    • (2006) Electrochem. Solid-State Lett , vol.9
    • Sinha, A.1    Hess, D.W.2    Henderson, C.L.3
  • 82
    • 33746615230 scopus 로고    scopus 로고
    • Selective area atomic layer deposition of rhodium and effective work function characterization in capacitor structures
    • Park, K.J. and Parsons, G.N. (2006) Selective area atomic layer deposition of rhodium and effective work function characterization in capacitor structures. Appl. Phys. Lett., 89 (4), 043111.
    • (2006) Appl. Phys. Lett , vol.89 , Issue.4 , pp. 043111
    • Park, K.J.1    Parsons, G.N.2    Park, K.J.3    Parsons, G.N.4
  • 84
    • 1642588346 scopus 로고    scopus 로고
    • Ruthenium films by digital chemical vapor deposition: selectivity, nanostructure, and work function
    • Dey, S.K., Goswami, J., Gu, D., deWaard, H.,Marcus, S., andWerkhoven, C. (2004) Ruthenium films by digital chemical vapor deposition: selectivity, nanostructure, and work function. Appl. Phys. Lett., 84 (9), 1606.
    • (2004) Appl. Phys. Lett , vol.84 , Issue.9 , pp. 1606
    • Dey, S.K.1    Goswami, J.2    Gu, D.3    de Waard, H.4    Marcus, S.5    Werkhoven, C.6
  • 86
    • 44149092898 scopus 로고    scopus 로고
    • Nanopatterning materials using area selective atomic layer deposition in conjunction with thermochemical surface modification via heatedAFMcantilever probe lithography
    • Hua, Y.M., King, W.P., and Henderson, C.L. (2008) Nanopatterning materials using area selective atomic layer deposition in conjunction with thermochemical surface modification via heatedAFMcantilever probe lithography. Microelectron. Eng., 85 (5-6), 934.
    • (2008) Microelectron. Eng , vol.85 , Issue.5-6 , pp. 934
    • Hua, Y.M.1    King, W.P.2    Henderson, C.L.3
  • 88
    • 0001306082 scopus 로고    scopus 로고
    • Surface cemistry in the chemical vapor deposition of electronic materials
    • Gates, S.M. (1996) Surface chemistry in the chemical vapor deposition of electronic materials. Chem. Rev., 96 (4), 1519.
    • (1996) Chem. Rev , vol.96 , Issue.4 , pp. 1519
    • Gates, S.M.1    Gates, S.M.2
  • 89
    • 0027595707 scopus 로고
    • Areaselective CVD of metals
    • Tsubouchi, K. and Masu, K. (1993) Areaselective CVD of metals. Thin Solid Films, 228 (1-2), 312.
    • (1993) Thin Solid Films , vol.228 , Issue.1-2 , pp. 312
    • Tsubouchi, K.1    Masu, K.2
  • 90
    • 0032094711 scopus 로고    scopus 로고
    • Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
    • Yokoyama, S., Ikeda, N., Kajikawa, K., and Nakashima, Y. (1998) Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces. Appl. Surf. Sci., 130, 352.
    • (1998) Appl. Surf. Sci , vol.130 , pp. 352
    • Yokoyama, S.1    Ikeda, N.2    Kajikawa, K.3    Nakashima, Y.4
  • 97
    • 0036565106 scopus 로고    scopus 로고
    • Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
    • Kim, H. and Rossnagel, S.M. (2002) Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition. J. Vac. Sci. Technol. A, 20 (3), 802.
    • (2002) J. Vac. Sci. Technol. A , vol.20 , Issue.3 , pp. 802
    • Kim, H.1    Rossnagel, S.M.2    Kim, H.3    Rossnagel, S.M.4
  • 99
    • 0346291270 scopus 로고    scopus 로고
    • Growth per cycle in atomic layer deposition: a theoretical model
    • Puurunen, R.L. (2003) Growth per cycle in atomic layer deposition: a theoretical model. Chem. Vapor Depos., 9 (5), 249.
    • (2003) Chem. Vapor Depos , vol.9 , Issue.5 , pp. 249
    • Puurunen, R.L.1    Puurunen, R.L.2
  • 100
    • 0036589258 scopus 로고    scopus 로고
    • Organometallic chemistry on silicon and germanium surfaces
    • Buriak, J.M. (2002) Organometallic chemistry on silicon and germanium surfaces. Chem. Rev., 102 (5), 1271.
    • (2002) Chem. Rev , vol.102 , Issue.5 , pp. 1271
    • Buriak, J.M.1    Buriak, J.M.2
  • 109
    • 38449100983 scopus 로고    scopus 로고
    • Selective atomic layer deposition of metal oxide thin films on patterned selfassembled monolayers formed by microcontact printing
    • Lee, B.H. and Sung, M.M. (2007) Selective atomic layer deposition of metal oxide thin films on patterned selfassembled monolayers formed by microcontact printing. J. Nanosci. Nanotechnol., 7 (11), 3758.
    • (2007) J. Nanosci. Nanotechnol , vol.7 , Issue.11 , pp. 3758
    • Lee, B.H.1    Sung, M.M.2    Lee, B.H.3    Sung, M.M.4
  • 112
    • 12444344720 scopus 로고    scopus 로고
    • Nanofabrication with molds & stamps
    • Gates, B.D. (2005) Nanofabrication with molds & stamps. Mater. Today, (2), 44.
    • (2005) Mater. Today , Issue.2 , pp. 44
    • Gates, B.D.1    Gates, B.D.2
  • 114
    • 0000767293 scopus 로고    scopus 로고
    • Soft lithographic methods for nano-fabrication
    • Zhao, X.M. (1997) Soft lithographic methods for nano-fabrication. J. Mater. Chem., 7 (7), 1069.
    • (1997) J. Mater. Chem , vol.7 , Issue.7 , pp. 1069
    • Zhao, X.M.1    Zhao, X.M.2
  • 116
    • 0000604549 scopus 로고    scopus 로고
    • Conformal contact and pattern stability of stamps used for soft lithography
    • Bietsch, A. and Michel, B. (2000) Conformal contact and pattern stability of stamps used for soft lithography. J. Appl. Phys., 88 (7), 4310.
    • (2000) J. Appl. Phys , vol.88 , Issue.7 , pp. 4310
    • Bietsch, A.1    Michel, B.2    Bietsch, A.3    Michel, B.4
  • 118
    • 4544291829 scopus 로고    scopus 로고
    • Patterning of thin-film microstructures on non-planar substrate surfaces using decal transfer lithography
    • Childs, W.R. and Nuzzo, R.G. (2004) Patterning of thin-film microstructures on non-planar substrate surfaces using decal transfer lithography. Adv. Mater., (15), 1323.
    • (2004) Adv. Mater , Issue.15 , pp. 1323
    • Childs, W.R.1    Nuzzo, R.G.2    Childs, W.R.3    Nuzzo, R.G.4
  • 119
    • 37149045600 scopus 로고    scopus 로고
    • Creating microand nanostructures on tubular and spherical surfaces
    • Lima, O., Tan, L., Goel, A., Negahban, M., and Li, Z. (2007) Creating microand nanostructures on tubular and spherical surfaces. J. Vac. Sci. Technol. B, 25, 2412.
    • (2007) J. Vac. Sci. Technol. B , vol.25 , pp. 2412
    • Lima, O.1    Tan, L.2    Goel, A.3    Negahban, M.4    Li, Z.5
  • 123
    • 60449118442 scopus 로고    scopus 로고
    • Supramolecular organization of polymeric materials in nanoporous hard templates
    • Steinhart, M. (2008) Supramolecular organization of polymeric materials in nanoporous hard templates. Adv. Polym. Sci., 220, 123.
    • (2008) Adv. Polym. Sci , vol.220 , pp. 123
    • Steinhart, M.1
  • 126
    • 27244455531 scopus 로고
    • Nanosphere lithography: a materials general fabrication process for periodic particle array surfaces
    • Hulteen, J.C. and Van Duyne, R.P. (1995) Nanosphere lithography: a materials general fabrication process for periodic particle array surfaces. J. Vac. Sci. Technol. A, 13 (3), 1553.
    • (1995) J. Vac. Sci. Technol. A , vol.13 , Issue.3 , pp. 1553
    • Hulteen, J.C.1    Van Duyne, R.P.2    Hulteen, J.C.3    Van Duyne, R.P.4
  • 131
    • 27644474237 scopus 로고    scopus 로고
    • Removal of self-assembled monolayers of alkanethiolates on gold by plasma cleaning
    • Raiber, K., Terfort, A., Benndorf, C., Krings, N., and Strehblow, H.-H. (2005) Removal of self-assembled monolayers of alkanethiolates on gold by plasma cleaning. Surf. Sci., 595 (1-3), 56.
    • (2005) Surf. Sci , vol.595 , Issue.1-3 , pp. 56
    • Raiber, K.1    Terfort, A.2    Benndorf, C.3    Krings, N.4    Strehblow, H.-H.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.