Plasma Atomic Layer Deposition

Atomic Layer Deposition of Nanostructured Materials

Volumn , Issue , 2012, Pages 131-157

  Kessels, Erwin ^a   Profijt, Harald ^a   Potts, Stephen ^a   van de Sanden, Richard ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Atomic layer deposition; Plasma atomic layer deposition; Plasma processing; Plasma assisted atomic layer deposition; Plasma enhanced atomic layer deposition

Indexed keywords

EID: 84884059098     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1002/9783527639915.ch7     Document Type: Chapter

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