Plasma-enhanced atomic layer deposition of palladium on a polymer substrate

Chemical Vapor Deposition

Volumn 13, Issue 6-7, 2007, Pages 307-311

  Ten Eyck, Gregory A ^a   Pimanpang, Samuk ^b   Juneja, Jasbir S ^a   Bakhru, Hassaram ^c   Lu, Toh Ming ^b   Wang, Gwo Ching ^b  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b Rensselaer Polytechnic Institute   (United States)

^c STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

Amine; Palladium; Parylene N; PEALD; Polymer

Indexed keywords

ABS RESINS; AMINES; ATOMIC PHYSICS; ATOMS; CHEMISORPTION; DISSOCIATION; HYDROGEN; LIGANDS; MOLECULAR SPECTROSCOPY; NONMETALS; ORGANIC COMPOUNDS; PALLADIUM; PALLADIUM COMPOUNDS; PHOTODEGRADATION; PHOTOELECTRON SPECTROSCOPY; PHYSICAL VAPOR DEPOSITION; PLASMA APPLICATIONS; PLASMA DEPOSITION; PLASMAS; POLYMERS; PULSED LASER DEPOSITION; SUBSTRATES; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

ACTIVE SITES; ATOMIC HYDROGENS; ATOMIC LAYER DEPOSITION (ALD; ATOMIC LAYERS; HYDROGEN ATOMS; HYDROGEN/NITROGEN; MOLECULAR HYDROGENS; OPTIMIZING; PARYLENE; PARYLENE-N; PD FILMS; PEALD; PLASMA TREATMENTS; POLIES (P(SSACO PMS); POLYMER SUBSTRATES; POLYMER SURFACES; SUBSTRATE SURFACES; SUBSTRATE TEMPERATURES; VISIBLE DEGRADATIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES; XPS MEASUREMENTS;

ATOMIC LAYER DEPOSITION;

EID: 34548240860     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200606508     Document Type: Article

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