Self assembled monolayers on silicon for molecular electronics

Analytica Chimica Acta

Volumn 568, Issue 1-2, 2006, Pages 84-108

  Aswal, D K ^a,b   Lenfant, S ^a   Guerin, D ^a   Yakhmi, J V ^b   Vuillaume, D ^a  

^a INSTITUT D ELECTRONIQUE   (France)

^b BHABHA ATOMIC RESEARCH CENTRE   (India)

Author keywords

Electronic transport; Molecular electronics; Self assembled monolayers

Indexed keywords

ELECTROCHEMICAL ELECTRODES; ELECTRON TUNNELING; GRAFTING (CHEMICAL); MOLECULAR STRUCTURE; PARAFFINS; SEMICONDUCTING SILICON; TRANSISTORS;

COUNTERELECTRODES; ELECTRONIC TRANSPORT; MOLECULAR ELECTRONICS; ORGANIC MONOLAYERS; SILICON SUBSTRATES;

SELF ASSEMBLY;

ALKANE; ALKENE; ALUMINUM; GOLD; MERCURY; SILICON; SILICON DIOXIDE;

ATOMIC FORCE MICROSCOPY; BIOMOLECULAR ELECTRONICS; CHEMICAL COMPOSITION; CHEMICAL STRUCTURE; ELECTRICITY; ELECTROCHEMISTRY; ELECTRODE; HYDROSILYLATION; KINETICS; MATHEMATICAL MODEL; PRIORITY JOURNAL; REVIEW; SEMICONDUCTOR; SYNTHESIS; THEORETICAL MODEL; THERMOSTABILITY; VAPORIZATION;

EID: 33747435876     PISSN: 00032670     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.aca.2005.10.027     Document Type: Review

References (161)

1. Sze S.M. Semiconductor Devices: Physics and Technology (2002), John Wiley & Sons, New York
2. Moore G.E. Electronics 38 (1965) 1
3. Mann B., and Kuhn H. J. Appl. Phys. 42 (1971) 4398
4. Polymeropoulos E.E., and Sagiv J. J. Chem. Phys. 69 (1978) 1836
5. Netzer L., and Sagiv J. J. Am. Chem. Soc. 105 (1983) 674
6. Langmuir I. Trans. Faraday Soc. 15 (1920) 62
7. Ulman A. An Introduction to Ultrathin Organic Films From Langmuir-Blogett to Self-Assembly (1991), Academic Press
8. Aviram A., and Ratner M.A. Chem. Phys. Lett. 29 (1974) 277
9. F.L. Carter, R.E. Siatkowski, H. Wohltjen (Eds.), Molecular Electronic Devices: Proc. 3rd Int. Symp. on Molecular Electronic Devices, North-Holland, New York, 1989.
10. Binning G., Rohrer H., Gerber C., and Weibel E. Phys. Rev. Lett. 49 (1982) 57
11. Binnig G., and Rohrer H. Rev. Mod. Phys. 59 (1987) 615
12. Reed M.A., Zhou C., Miller C.J., Burgin T.P., and Tour J.M. Science 278 (1997) 252
13. Weber H.B., Reichert J., Weigend F., Ochs R., Beckmann D., Mayor M., Ahlrichs R., and von Löhneysen H. Chem. Phys. 281 (2002) 113
14. Kergueris C., Bourgoin I.P., Palacin S., Esteve D., Urbina C., Magoga M., and Joachim C. Phys. Rev. B 59 (1999) 12505
15. Kushmenck J.G., Holt D.B., Yang J.C., Naciri J., Moore M.H., and Shashidhar R. Phys. Rev. Lett. 89 (2002) 086802
16. Bezryadin A., Dekker C., and Schmid G. Appl. Phys. Lett. 71 (1997) 1273
17. Xu B., and Tao N.J. Science 301 (2003) 1221
18. Wold D.J., and Frisbie C.D. J. Am. Chem. Soc. 123 (2001) 5549
19. Cui X.D., Zarate X., Tomfohr J., Sankey O.F., Primak A., Moore A.L., Moore T.A., Gust D., Harris G., and Lindsay S.M. Nanotechnology 13 (2002) 5
20. Cui X.D., Primak A., Zarate X., Tomfohr J., Sankey O.F., Moore A.L., Moore T.A., Gust D., Nagahara L.A., and Lindsay S.M. J. Phys. Chem. B 106 (2002) 8609
21. Chen J., Reed M.A., Rawlett A.M., and Tour J.M. Science 286 (1999) 1550
22. Zhou C., Deshpande M.R., Reed M.A., Jones II L., and Tour J.M. Appl. Phys. Lett. 71 (1997) 611
23. Ralls K.S., Buhrman R.A., and Tiberio R.C. Appl. Phys. Lett. 55 (1989) 2459
24. Salomon A., Cahen D., Lindsay S.M., Tomfohr J., Engelkes V.B., and Frisbie C.D. Adv. Mater. 15 (2003) 1881
25. Nuzzo R.G., and Allara D.L. J. Am. Chem. Soc. 105 (1983) 4481
26. Ulman A. Chem. Rev. 96 (1996) 1533
27. Dubois L.H., and Nuzzo R.G. Annu. Rev. Phys. Chem. 43 (1992) 437
28. Schreiber F. Prog. Surf. Sci. 65 (2000) 151
29. Schreiber F. J. Phys.: Condens. Matter 16 (2004) R881
30. Love J.C., Estroff L.A., Kriebel J.K., Nuzzo R.G., and Whitesides G.M. Chem. Rev. 105 (2005) 1103
31. Bigelow W.C., Pickett D.I., and Zisman W.A. J. Colloid Sci. 1 (1946) 513
32. Maoz R., and Sagiv J. J. Colloid Interf. Sci. 100 (1984) 465
33. Aswal D.K., Lenfant S., Guerin D., Yakhmi J.V., and Vuillaume D. Small 1 (2005) 725
34. Miramond C., and Vuillaume D. J. Appl. Phys. 96 (2004) 1529
35. Lenfant S., Krzeminski C., Delerue C., Aallan G., and Vuillaume D. Nano Lett. 3 (2003) 741
36. Vuillaume D. J. Nanosci. Nanotechnol. 2 (2002) 267
37. S. Lenfant, Ph.D. Thesis, Organic self-assembled monolayers for molecular diodes, 2001. University of Science and Technology, Lille, France.
38. Kar S., Miramond C., and Vuillaume D. Appl. Phys. Lett. 78 (2001) 1288
39. Collet J., Tharaud O., Chapoton A., and Vuillaume D. Appl. Phys. Lett. 76 (2000) 1941
40. L. Breuil, Ph.D. Thesis, 2000. University of Science and Technology, Lille, France.
41. Collet J., Lenfant S., Vuillaume D., Bouloussa O., Rondelez F., Gay J.M., Kham K., and Chevrot C. Appl. Phys. Lett. 76 (2000) 1339
42. Collet J., and Vuillaume D. Appl. Phys. Lett. 78 (1998) 2681
43. Vuillaume D., Boulas C., Collet J., Allan G., and Delerue C. Phys. Rev. B 58 (1998) 16491
44. Vuillaume D. Mater. Res. Soc. Proc. 446 (1997) 79
45. Boulas C., Davindovits J., Rondelez F., and Vuillaume D. Phys. Rev. Lett. 76 (1996) 4797
46. Vuillaume D., Boulas C., Collet J., Davindovits J., and Rondelez F. Appl. Phys. Lett. 69 (1996) 1646
47. Fontaine P., Goguenheim D., Deresmes D., Vuillaume D., Garret M., and Rondelez F. Appl. Phys. Lett. 62 (1993) 2256
48. Guisinger N.P., Greene M.E., Basu R., Baluch A.S., and Hersam M.C. Nano Lett. 4 (2004) 55
49. Wolf S., and Tauber R. Silicon Processing Vol. 1 (1986), Lattice Press, CA
50. W. Kern, D.A. Puotinen, Cleaning solutions based on hydrogen peroxide for use in silicon semiconductor technology, RCA Rev. (1970) 187.
51. Brzoska J.B., Azouz I.B., and Rondelez F. Langmuir 10 (1994) 4367
52. Wasserman S.R., Tao Y.-T., and Whitesides G.M. Langmuir 5 (1989) 1074
53. Tillman N., Ulman A., Schildkraut J.S., and Penner T.L. J. Am. Chem. Soc. 110 (1988) 6136
54. Petitdidier S., Bertagna V., Rochat N., Rouchon D., Besson P., Erre R., and Chemla M. Thin Solid Films 476 (2005) 51
55. Choi K., Eom T.-J., and Lee C. Thin Solid Films 435 (2003) 227
56. Hergenrother P.J., Depew K.M., and Schreiber S.L. J. Am. Chem. Soc. 122 (2000) 7849
57. Petrucci M.G.L., and Kakkar A.K. Chem. Mater. 11 (1999) 269
58. Major R.C., and Zhu X.-Y. Langmuir 17 (2001) 5576
59. Rozlosnik N., Gerstenberg M.C., and Larsen N.B. Langmuir 19 (2003) 1182
60. Pavlovic E., Quist A.P., Gelius U., and Oscarsson S. J. Colloid Interf. Sci. 254 (2002) 200
61. Ledung G., Bergkvist M., Quist A.P., Gelius U., Carlsson J., and Oscarsson S. Langmuir 17 (2001) 6056
62. Buriak J.M. Chem. Rev. 102 (2002) 1271
63. Bent S.F. Surf. Sci. 500 (2002) 879
64. Higashi G.S., Chabal Y.J., Trucks G.W., and Raghavachari K. Appl. Phys. Lett. 56 (1990) 656
65. Higashi G.S., Becker R.S., Chabal Y.J., and Becker A.J. Appl. Phys. Lett. 58 (1991) 1656
66. Bansal A., Li X., Lauermann I., and Lewis N.S. J. Am. Chem. Soc. 118 (1996) 7225
67. Bansal A., Li X., Yi S.I., Weinberg W.H., and Lewis N.S. J. Phys. Chem. B 105 (2001) 10266
68. Zhu X.-Y., Boiadjiev V., Mulder J.A., Hsung R.P., and Major R.C. Langmuir 16 (2000) 6766
69. Eves B.J., and Lopinski G.P. Surf. Sci. 579 (2005) L89
70. Narducci D., Pedemonte L., and Bracco G. Appl. Surf. Sci. 212 (2003) 649
71. Pedemonte L., Bracco G., Relini A., Rolandi R., and Narducci D. Appl. Surf. Sci. 212 (2003) 595
72. Lauerhaas J.M., and Sailor M.J. Science 261 (1993) 1567
73. Lauerhaas J.M., and Sailor M.J. Mater. Res. Soc. Symp. Proc. 298 (1993) 259
74. Joy V.T., and Mandler D. Chem. Phys. Chem. 3 (2002) 973
75. Duke C.B. Chem. Rev. 96 (1996) 1237
76. Waltenberg H.N., and Yates Jr. J.T. Chem. Rev. 95 (1995) 1589
77. Linford M.R., and Chidsey C.E.D. J. Am. Chem. Soc. 115 (1993) 12631
78. Linford M.R., Fenter P., Eisenberger P.M., and Chidsey C.E.D. J. Am. Chem. Soc. 117 (1995) 3145
79. Labinger J.A. In: Trost B.M., and Fleming I. (Eds). Comprehensive Organic Synthesis Vol. 8 (1991), Pergamon, New York 699
80. Sung M.M., Kluth J., Yauw O.W., and Maboudian R. Langmuir 13 (1997) 6164
81. Terry J., Linford M.R., Wigren C., Cao R., Pianetta P., and Chidsey C.E.D. Appl. Phys. Lett. 71 (1997) 1056
82. Cicero R.L., Linford M.R., and Chidsey C.E.D. Langmuir 16 (2000) 5688
83. de Villeneuve C.H., Pinson J., Bernard M.C., and Allongue P. J. Phys. Chem. B 101 (1997) 2415
84. Song J.H., and Sailor M.J. J. Am. Chem. Soc. 120 (1998) 2376
85. Kim N.Y., and Laibinis P.E. J. Am. Chem. Soc. 121 (1999) 7162
86. Konecny R., and Doren D.J. Surf. Sci 417 (1998) 169
87. Liu Q., and Hoffmann R.J. J. Am. Chem. Soc. 117 (1995) 4082
88. Huang C., Widdra W., Wang X.S., and Weinberg W.H. J. Vac. Sci. Technol. A 11 (1993) 2250
89. Terborg R., Baumgartel P., Lindsay R., Schaff O., Giessel T., Hoeft J.T., Polcik M., Toomes R.L., Kulkarni S., Bradshaw A.M., and Woodruff D.P. Phys. Rev. B 61 (2000) 16697
90. Nyffenegger R.M., and Penner R.M. Chem. Rev. 97 (1997) 1195
91. Abeln G.C., Lee S.Y., Lyding J.W., Thompson D.S., and Moore J.S. Appl. Phys. Lett. 70 (1997) 2747
92. Petty M.C. In: Roberts G. (Ed). Langmuir-Blodgett Films (1990), Plenum Press, New York
93. Azzam R.M.A., and Bashara N.M. Ellipsometry and Polarized Light (1977), North Holland, Amsterdam
94. Rothenhausler B., Duschl C., and Knoll W. Thin Solid Films 150 (1988) 323
95. Pomerantz M., and Segmuller A. Thin Solid Films 68 (1980) 33
96. Nakagiri T., Sakai K., Lida A., Ishikawa T., and Matsushita T. Thin Sold Films 133 (1985) 219
97. Allara D.L., Parikh A.N., and Rondelez F. Langmuir 11 (1995) 2357
98. Sieval A.B., Vleeming V., Zuilhof H., and Sudholter E.J.R. Langmuir 15 (1999) 8288
99. Cheng J., Robinson D.B., Cicero R.L., Eberspacher T., Barrelet C.J., and Chidsey C.E.D. J. Phys. Chem. B 105 (2001) 10900
100. Sieval A.B., van den Hout B., Zuilhof H., and Sudholter E.J.R. Langmuir 17 (2001) 2172
101. Porter M.D., Bright T.B., Allara D.L., and Chidsey C.E.D. J. Am. Chem. Soc. 109 (1987) 3559
102. Srivastava V.K., and Verma A.R. Solid State Commun. 4 (1966) 367
103. Bonnerot A., Chollet P.A., Frisby H., and Hoclet M. Chem. Phys. 97 (1985) 365
104. Valkova L., Menelle A., Borovkov N., Erokhin V., Pisani M., Ciuchi F., Carsughi F., Spinozzi F., Pergolini M., Padke R., Bernstorff S., and Rustichelli F. J. Appl. Cryst. 36 (2003) 758
105. Becker R., Ashton M.R., Jones T.S., Richardson N.V., and Sotobayashi H. J. Phys.: Condens. Matter 3 (1991) S29
106. Takenaka T. Chem. Phys. Lett. 55 (1978) 515
107. Fujimori A., Ishitsuka M., Nakahara H., Ito E., Hara M., Kanai K., Ishii H., Ouchi Y., and Seki K. J. Poly. Sci. B. 42 (2004) 2329
108. Fadeev A.Y., and McCarthy T.J. Langmuir 16 (2000) 7268
109. Persson H.H.J., Caseri W.R., and Suter U.W. Langmuir 17 (2001) 3643
110. Kluth G.J., Sung M.M., and Maboudian R. Langmuir 13 (1997) 3775
111. Ahn H., Kim M., Sandman D.J., and Whitten J.E. Langmuir 19 (2003) 5303
112. Friedli A.C., Roberts R.D., Dulcey C.S., Hsu A.R., McElvany S.W., and Calvert J.M. Langmuir 20 (2004) 4295
113. Senkevich J.J., Mitchell C.J., Yang G.-R., and Lu T.-M. Langmuir 18 (2002) 1587
114. Balachander N., and Sukenik C.N. Langmuir 6 (1990) 1621
115. Baker M.V., and Watling J.D. Langmuir 13 (1997) 2027
116. Sfez R., De-Zhong L., Turyan I., Mandler D., and Yitzchaik S. Langmuir 17 (2001) 2556
117. Laibinis P.E., and Whitesides G.M. J. Am. Chem. Soc. 114 (1992) 1990
118. Frutos A.G., Brockman J.M., and Corn R.M. Langmuir 16 (2000) 2192
119. Lee M.-T., and Ferguson G.S. Langmuir 17 (2001) 762
120. Tsukruk V.V., Lander L.M., and Bnttain W.J. Langmuir 10 (1994) 996
121. Shon Y.-S., Kelly K.F., Halas N.J., and Lee T.R. Langmuir 15 (1999) 5329
122. Zisman W. In: Fowkes F.M. (Ed). Contact Angle, Wettability, and Adhesion Vol. 43 (1964), Americal Chemical Society, Washington 1
123. Kojio K., Ge S., Takahara A., and Kajiyama T. Langmuir 14 (1998) 971
124. Doudevski I., Hayes W.A., and Schwartz D.K. Phys. Rev. Lett. 81 (1998) 4927
125. Schwartz D.K., Steinberg S., Israelachvili J., and Zasadzinski J.A.N. Phys. Rev. Lett. 69 (1992) 3354
126. Bierbaum K., Grunze M., Baski A.A., Chi L.F., Schrepp W., and Fuchs H. Langmuir 11 (1995) 2143
127. Sabatani E., and Rubinstein I. J. Phys. Chem. 91 (1987) 6663
128. Finklea H.O. Self assembled monolayers on electrodes. In: Robert A. (Ed). Meyers Encyclopedia of Analytical Chemistry (2000), John Wiley & Sons Ltd, Chichester. 0471 97670 9
129. Briggs D., and Seah M.P. Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy (1983), Wiley
130. Selzer Y., Salomon A., and Cahen D. J. Phys. Chem. B 106 (2002) 10432
131. Liu Y.-L., and Yu H.-Z. Chem. Phys. Chem. 19 (2002) 799
132. Metzger R.M., Xu T., and Peterson I.R. J. Phys. Chem. B 105 (2001) 7280
133. Xia Y., and Whitesides G.M. Angew. Chem. Int. Ed. 37 (1998) 550
134. Jeon S., Menard E., Park J.-U., Maria J., Meitel M., Zaumseil J., and Rogers J.A. Adv. Mater. 16 (2004) 1369
135. Krzeminski C., Delerue C., Aallan G., Vuillaume D., and Metzger R.M. Phys. Rev. B 64 (2001) 085405
136. Halik M., Klauk H., Zschieschang U., Schmid G., Dehm C., Schütz M., Maisch S., Effenberger F., Brunnbauer M., and Stellacci F. Nature 431 (2004) 963
137. Davies P.C.W., and Betts D.S. Quantum Mechanics (1994), Chapman & Hall, London
138. Simmons J.G. J. Appl. Phys. 34 (1963) 2581
139. Hesto P. In: Barbottin G., and Vapaille A. (Eds). Instabilities in Silicon Devices (1986), North Holland, Netherlands 263
140. D.R. Lide (Ed.), CRC Handbook of Chemistry and Physics, 74th ed., CRC Press, Boca Raton, 1993-1994, pp. 12-105.
141. Tomfohr J.M., and Sankey O.F. Phys. Rev. B 65 (2002) 245105
142. Lenzlinger M., and Snow E.H. J. Appl. Phys. 40 (1969) 278
143. Selzer Y., Salomon A., and Cahen D. J. Am. Chem. Soc. 124 (2002) 2886
144. Porti M., Nafria N., Aymerich X., Olbrich A., and Ebersberger B. J. Appl. Phys. 91 (2002) 2071
145. Zhou J., and Uosaki K. Appl. Phys. Lett. 83 (2003) 2034
146. Green M.L., Gusev E.P., Degraeve R., and Garfunkel E.L. J. Appl. Phys. 90 (2001) 2057
147. Metzger R.M. Chem. Rev. 103 (2003) 3803
148. Metzger R.M., Chen B., Höpfner U., Lakshmikantham M.V., Vuillaume D., Kawai T., Wu X., Tachibana H., Hughes T.V., Sakurai H., Baldwin J.W., Hosch C., Cava M.P., Brehmer L., and Ashwell G.J. J. Am. Chem. Soc. 119 (1997) 10455
149. Kornilovitch P.E., Bratkovsky A.M., and Williams R.S. Phys. Rev. B 66 (2002) 165436
150. Hall L.E., Reimers J.R., Hush N.S., and Silverbrook K. J. Chem. Phys. 112 (2000) 1510
151. Vuillaume D., Chen B., and Metzger R.M. Langmuir 15 (1999) 4011
152. Budavari S. The Merck Index. 12th ed. (1996), Merck & Co. Inc., Whitehouse Station
153. W.G. Kuhr, A.R. Gallo, R.W. Manning, C.W. Rhodine, MRS Bull. November (2004) 838.
154. Liu Z., Yasseri A.A., Lindsey J.S., and Bocian D.F. Science 302 (2003) 1543
155. Roth K.M., Dontha N., Dabke R.B., Gryko D.T., Clausen C., Lindsey J.S., Bocian D.F., and Kuhr W.G. J. Vac. Sci. Technol. B 18 (2000) 2359
156. Schon J.H., Meng H., and Bao Z. Nature 413 (2001) 713
157. Schon J.H., Meng H., and Bao Z. Science 294 (2001) 2138
158. Schon J.H., and Bao Z. Appl. Phys. Lett. 80 (2002) 847
159. M.R. Beasley, S. Datta, H. Kogelnik, H. Kroemer, D. Monroe, Report of the Investigation Committee on the Possibility of Scientific Misconduct in the Work of Hendrik Schon and Coauthors, September 2002.
160. Kagan C.R., Afzali A., Martel R., Gignac L.M., Solomon P.M., Schrott A.G., and Ek B. Nano Lett. 3 (2003) 119
161. Tulevski G.S., Miao Q., Fukuto M., Abram R., Ocko B., Pindak R., Steigerwald M.L., Kagan C.R., and Nuckolls C. J. Am. Chem Soc. 126 (2004) 15048