Surface chemistry for molecular layer deposition of organic and hybrid organic-inorganic polymers

Accounts of Chemical Research

Volumn 42, Issue 4, 2009, Pages 498-508

  George, Steven M ^a,b   Dameron, Arrelaine A ^a   Yoon, Byunghoon ^a  

^a Departments of Chemistry and Biochemistry   (United States)

^b UCB 450   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 66449127373     PISSN: 00014842     EISSN: None     Source Type: Journal    
DOI: 10.1021/ar800105q     Document Type: Article

References (41)

1. George, S. M.; Ott, A. W.; Klaus, J. W. Surface chemistry for atomic layer growth. J. Phys. Chem. 1996, 100, 13121-13131. (Pubitemid 126821050)
2. Suntola, T. Atomic layer epitaxy. Thin Solid Films 1992, 216, 84-89.
3. Ritala, M.; Leskela, M.; Dekker, J. P.; Mutsaers, C.; Soininen, P. J.; Skarp, J. Perfectly conformal TiN and Al2O3 films deposited by atomic layer deposition. Chem. Vap. Deposition 1999, 5, 7-9.
4. Groner, M. D.; Elam, J. W.; Fabreguette, F. H.; George, S. M. Electrical characterization of thin Al2O3 films grown by atomic layer deposition on silicon and various metal substrates. Thin Solid Films 2002, 413, 186-197. (Pubitemid 34772312)
5. Puurunen, R. L. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process. J. Appl. Phys. 2005, 97, 121301.
6. Ritala, M.; Leskela, M. Atomic layer deposition. In Handbook of Thin Film Materials; Nalwa, H. S., Ed.; Academic Press: New York, 2001; Vol.1.
7. Dillon, A. C.; Ott, A. W.; Way, J. D.; George, S. M. Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence. Surf. Sci. 1995, 322, 230-242.
8. Ott, A. W.; Klaus, J. W.; Johnson, J. M.; George, S. M. Al2O3 thin film growth on Si(100) using binary reaction sequence chemistry. Thin Solid Films 1997, 292, 135-144.
9. Ritala, M.; Leskela, M.; Rauhala, E.; Haussalo, P. Atomic layer epitaxy growth of TiN thin films. J. Electrochem. Soc. 1995, 142, 2731-2737.
10. Du, Y.; George, S. M. Molecular layer deposition of nylon 66 films examined using in situ FTIR spectroscopy. J. Phys. Chem. C 2007, 111, 8509-8517. (Pubitemid 47152627)
11. Yoshimura, T.; Tatsuura, S.; Sotoyama, W. Polymer films formed with monolayer growth steps by molecular layer deposition. Appl. Phys. Lett. 1991, 59, 482-484.
12. Kubono, A.; Yuasa, N.; Shao, H. L.; Umemoto, S.; Okui, N. In situ study on alternating vapor deposition polymerization of alkyl polyamide with normal molecular orientation. Thin Solid Films 1996, 289, 107-111. (Pubitemid 126391017)
13. Nagai, A.; Shao, H. L.; Umemoto, S.; Kikutani, T.; Okui, N. Quadruple aliphatic polyamide systems prepared by a layer-by-layer alternating vapour deposition method. High Perform. Polym. 2001, 13, S169-S179.
14. Shao, H. I.; Umemoto, S.; Kikutani, T.; Okui, N. Layer-by-layer polycondensation of nylon 66 by alternating vapour deposition polymerization. Polymer 1997, 38, 459-462. (Pubitemid 127422457)
15. Yoshimura, T.; Tatsuura, S.; Sotoyama, W.; Matsuura, A.; Hayano, T. Quantum wire and dot formation by chemical vapor deposition and molecular layer deposition of one-dimensional conjugated polymer. Appl. Phys. Lett. 1992, 60, 268-270.
16. Bitzer, T.; Richardson, N. V. Demonstration of an imide coupling reaction on a Si(100)-2 × 1 surface by molecular layer deposition. Appl. Phys. Lett. 1997, 71, 662-664. (Pubitemid 127638839)
17. Haq, S.; Richardson, N. V. Organic beam epitaxy using controlled PMDA-ODA coupling reactions on Cu{110}. J. Phys. Chem. B 1999, 103, 5256-5265. (Pubitemid 129702798)
18. Putkonen, M.; Harjuoja, J.; Sajavaara, T.; Niinisto, L. Atomic layer deposition of polyimide thin films. J. Mater. Chem. 2007, 17, 664-669. (Pubitemid 46246167)
19. Miyamae, T.; Tsukagoshi, K.; Matsuoka, O.; Yamamoto, S.; Nozoye, H. Preparation of polyimide-polyamide random copolymer thin film by sequential vapor deposition polymerization. Jpn. J. Appl. Phys., Part 1 2002, 41, 746-748. (Pubitemid 34750309)
20. Kim, A.; Filler, M. A.; Kim, S.; Bent, S. F. Layer-by-layer growth on Ge(100) via spontaneous urea coupling reactions. J. Am. Chem. Soc. 2005, 127, 6123-6132. (Pubitemid 40577669)
21. Lee, J. S.; Lee, Y. J.; Tae, E. L.; Park, Y. S.; Yoon, K. B. Synthesis of zeolite as ordered multicrystal arrays. Science 2003, 301, 818-821. (Pubitemid 36962619)
22. Kubono, A.; Okui, N. Polymer thin films prepared by vapor deposition. Prog. Polym. Sci. 1994, 19, 389-438. (Pubitemid 124001538)
23. Salem, J. R.; Sequeda, F. O.; Duran, J.; Lee, W. Y.; Yang, R. M. Solventless polyimide films by vapor deposition. J. Vac. Sci. Technol., A 1986, 4, 369-374.
24. Takahashi, Y.; Iijima, M.; Inagawa, K.; Itoh, A. Synthesis of aromatic polyimide film by vacuum deposition polymerization. J. Vac. Sci. Technol., A 1987, 5, 2253-2256.
25. Kubono, A.; Okui, N.; Tanaka, K.; Umemoto, S.; Sakai, T. Highly oriented polyamide thin films prepared by vapor deposition polymerization. Thin Solid Films 1991, 199, 385-393.
26. Takahashi, Y.; Iijima, M.; Oishi, Y.; Kakimoto, M.; Imai, Y. Preparation of ultrathin films of aromatic polyamides and aromatic poly(amide imides) by vapor deposition polymerization. Macromolecules 1991, 24, 3543-3546. (Pubitemid 21650186)
27. Takahashi, Y.; Iijima, M.; Fukada, E. Pyroelectricity in poled thin films of aromatic polyurea prepared by vapor deposition polymerization. Jpn. J. Appl. Phys., Part 2 1989, 28, L2245-L2247.
28. Adamczyk, N. M.; Dameron, A. A.; George, S. M. Molecular layer deposition of poly(p-phenylene terephthalamide) films using terephthaloyl chloride and pphenylenediamine. Langmuir 2008, 24, 2081-2089.
29. Frederick, B. G.; Richardson, N. V.; Unertl, W. N.; Elfarrash, A. Reaction of aniline with chemisorbed pyromellitic dianhydride on Cu(110)sA model for controlled organic film growth. Surf. Interface Anal. 1993, 20, 434-440. (Pubitemid 23679743)
30. Dameron, A. A.; Seghete, D.; Burton, B. B.; Davidson, S. D.; Cavanagh, A. S.; Bertrand, J. A.; George, S. M. Molecular layer deposition of alucone polymer films using trimethylaluminum and ethylene glycol. Chem. Mater. 2008, 20, 3315-3326.
31. We initially reported our results on alucone MLD at the AVS Topical Conference on Atomic Layer Deposition (ALD2007) in San Diego, CA (Dameron, A. A.; et al. Molecular layer deposition of alucone polymer films using trimethylaluminum and ethylene glycol. AVS Topical Conference on Atomic Layer Deposition (ALD2007), San Diego, CA, June 26, 2007). We learned about a patent application that describes related work during a presentation by O. Nilsen at ALD2007 (Nilsen, O.; Fjellvag, H. Thin films prepared with gas phase deposition technique. Patent Cooperation Treaty, World Intellectual Property Organization, WO 2006/071126 A1, July 6, 2006).
32. McMahon, C. N.; Alemany, L.; Callender, R. L.; Bott, S. G.; Barron, A. R. Reaction of Al(Bu-t)3 with ethylene glycol: Intermediates to aluminum alkoxide (alucone) preceramic polymers. Chem. Mater. 1999, 11, 3181-3188. (Pubitemid 129692296)
33. Groner, M. D.; Fabreguette, F. H.; Elam, J. W.; George, S. M. Low temperature Al2O3 atomic layer deposition. Chem. Mater. 2004, 16, 639-645.
34. Yoon, B.; O'Patchen, J. L.; Seghete, D.; Cavanagh, A. S.; George, S. M. Molecular layer deposition of hybrid organic-inorganic polymer films using diethyl zinc and ethylene glycol. Chem. Vap. Deposition 2009, in press.
35. Arkles, B.; Pan, Y.; Larson, G. L.; Berry, D. H. Cyclic azasilanes: Volatile coupling agents for nanotechnology. In Silanes and Other Coupling Agents; Mittal, K. L., Ed.; VSP: Utrecht, The Netherlands, 2004; Vol.3, pp 179-191.
36. Zubkov, T.; Lucassen, A. C. B.; Freeman, D.; Feldman, Y.; Cohen, S. R.; Evmenenko, G.; Dutta, P.; van der Boom, M. E. Photoinduced deprotection and ZnO patterning of hydroxyl-terminated siloxane-based monolayers. J. Phys. Chem. B 2005, 109, 14144-14153.
37. Lee, B. H.; Ryu, M. K.; Choi, S. Y.; Lee, K. H.; Im, S.; Sung, M. M. Rapid vapor phase fabrication of organic-inorganic hybrid superlattices with monolayer precision. J. Am. Chem. Soc. 2007, 129, 16034-16041.
38. Yoon, B.; Seghete, D.; George, S. M. Molecular layer deposition of alucone polymer film using a three-step ABC reaction sequence. 2009, unpublished results.
39. Elam, J. W.; Wilson, C. A.; Schuisky, M.; Sechrist, Z. A.; George, S. M. Improved nucleation of TiN atomic layer deposition films on SILK low-k polymer dielectric using an Al2O3 atomic layer deposition adhesion layer. J. Vac. Sci. Technol., B 2003, 21, 1099-1107.
40. Ferguson, J. D.; Weimer, A. W.; George, S. M. Atomic layer deposition of Al2O3 films on polyethylene particles. Chem. Mater. 2004, 16, 5602-5609.
41. Wilson, C. A.; Grubbs, R. K.; George, S. M. Nucleation and growth during Al2O3 atomic layer deposition on polymers. Chem. Mater. 2005, 17, 5625-5634.