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Volumn 158, Issue 5, 2011, Pages

Ultra-thin aluminium oxide films deposited by plasma-enhanced atomic layer deposition for corrosion protection

(11) Potts, S E a Schmalz, L b Fenker, M b Daz, B c Wiatowska, J c Maurice, V c Seyeux, A c Marcus, P c Radnczi, G d Tth, L d Kessels, W M M a

a EINDHOVEN UNIVERSITY OF TECHNOLOGY (Netherlands)

b Depart of Electrochemistry Research Institute for Precious Metals and Metal Chemistry Fem (Germany)

c CNRS (France)

d RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

AL2024-T3; COREACTANTS; CYCLIC VOLTAMETRY; FILM DENSITY; NEUTRAL SALT SPRAY TEST; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; TEM; TEMPERATURE RANGE; THERMAL ALD; TOF SIMS; ULTRA-THIN; ULTRA-THIN ALUMINIUM OXIDE;

ALUMINUM; ATOMIC LAYER DEPOSITION; CORROSION; CORROSION PROTECTION; PLASMA DEPOSITION; PLASMAS; SECONDARY ION MASS SPECTROMETRY; THICK FILMS;

OXIDE FILMS;

EID: 79953227724 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3560197 Document Type: Article

Times cited : (105)

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