Plasma-Enhanced Chemical Vapor Deposition of Functional Coatings

Handbook of Deposition Technologies for Films and Coatings

Volumn , Issue , 2010, Pages 392-465

  Martinu, L ^a   Zabeida, O ^a   Klemberg Sapieha, J E ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84882851017     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1016/B978-0-8155-2031-3.00009-0     Document Type: Chapter

References (251)

1. Applications of Plasma Processes to VLSI Technology 1985, Wiley, New York. T. Sugano (Ed.).
2. Mort J., Jansen F. Plasma Deposited Thin Films 1986, CRC Press, Boca Raton.
3. Handbook of Plasma Processing Technology 1990, Noyes, Park Ridge, NJ. S.M. Rossnagel, J.J. Cuomo, W.D. Westwood (Eds.).
4. Plasma Deposition, Treatment and Etching of Polymers 1990, Academic Press, Boston. R. d'Agostino (Ed.).
5. Handbook of Deposition Technologies for Films and Coatings 1994, Noyes, Park Ridge, NJ. R.F. Bunshah (Ed.).
6. Handbook of Thin Film Process Technology 1996, IOP, Bristol. D. Glocker, I. Shah (Eds.).
7. Martinu L., Poitras D. J. Vac. Sci. Technol. A 2000, 18:2619.
8. Chemical Vapor Deposition, 13 (2007), special issue on low pressure PECVD.
9. Chemical Vapor Deposition, 11 (2005), special issue on atmospheric pressure PECVD.
10. Caquineau H., Enache I., Gherardi N., Naude N., Massines F. J. Phys. D: Appl. Phys. 2009, 42:125201.
11. Wertheimer M.R., Martinu L., Liston E.M. Chap. E3.0. Handbook of Thin Film Process Technology 1996, IOP, Bristol. D. Glocker, I. Shah (Eds.).
12. Plasma Etching - An Introduction 1990, Academic Press, Boston. D.M. Manos, D.L. Flamm (Eds.).
13. Liston E.M., Martinu L., Wertheimer M.R. J. Adhes. Sci. Technol. 1993, 7:1091.
14. Adhesion Promotion Techniques 1999, Marcel Dekker, New York. K.L. Mittal, L. Pizzi (Eds.).
15. Kushner M.J. J. Appl. Phys. 1988, 63:2532.
16. Microwave Excited Plasmas 1992, Elsevier, Amsterdam. M. Moisan, J. Pelletier (Eds.).
17. Moisan M., Barbeau C., Claude R., Ferreira C.M., Margot J., Paraszczak J. J. Vac. Sci. Technol. B 1991, 9:8.
18. Martinu L., Klemberg-Sapieha J.E., Kuettel O.M., Raveh A., Wertheimer M.R. J. Vac. Sci. Technol. A 1994, 12:1360.
19. Okada K., Komatsu S., Matsumoto S. J. Vac. Sci. Technol. A 1999, 17:721.
20. Pomot C., Pelletier J. Chap. 13. Microwave Excited Plasmas 1992, Elsevier, Amsterdam. M. Moisan, J. Pelletier (Eds.).
21. Lieberman M.A., Lichtenberg A.J. Principles of Plasma Discharges and Materials Processing 1994, Wiley, New York.
22. Benoit-Cattin P., Bernard L.-C. J. Appl. Phys. 1968, 39:5723.
23. Coburn J.W., Kay E. J. Appl. Phys. 1972, 43:4965.
24. Zakrzewski Z., Moisan M. Plasma Sources Sci. Technol. 1995, 4:379.
25. Segner J. Chap. 7. Thin Films for Optical Systems 1995, 209. Marcel Dekker, New York. F.R. Flory (Ed.).
26. Thin Films on Glass, Schott Series on Glass and Glass Ceramics 1997, Springer, Berlin. H. Bach, D. Krause (Eds.).
27. Martinu L., Klemberg-Sapieha J.E., Wertheimer M.R. Appl. Phys. Lett. 1989, 54:2645.
28. Klemberg-Sapieha J.E., Kuttel O.M., Martinu L., Wertheimer M.R. Thin Solid Films 193/194 1990, 965.
29. Rostaing C., Coeuret F., Drevillon B., Etemadi R., Godet C., Huc J. Thin Solid Films 1993, 236:58.
30. Etemadi R., Godet C., Kildemo M., Bouree J.E., Brenot R., Drevillon B. J. Non-Cryst. Solids 1995, 187:70.
31. Burke R.R., Pelletier J., Pomot C., Vallier L. J. Vac. Sci. Technol. A 1991, 8:2931.
32. Bulkin P., Bertrand N., Drevillon B. Thin Solid Films 1997, 296:66.
33. Leskela M., Ritala M. Thin Solid Films 2002, 409:138.
34. Rossnagel S.M., Sherman A., Turne F. J. Vac. Sci. Technol. B 2000, 18:2016.
35. Creatore M., Cigal J.-C., Kroesen G.M.W., van de Sanden M.C.M. Thin Solid Films 2005, 484:104.
36. Gielen J.W.A.M., van de Sanden M.C.M., Schram D.C. Appl. Phys. Lett. 1996, 69:152.
37. Biederman H., Martinu L. Chap. 4. Plasma Deposition, Treatment and Etching of Polymers 1990, 269. Academic Press, Boston. R. d'Agostino (Ed.).
38. Dalacu D., Martinu L. J. Vac. Sci. Technol. A 1999, 17:877.
39. Lamarre J.-M., Yu Z., Harkati C., Roorda S., Martinu L. Thin Solid Films 2005, 479:232.
40. Kanazawa S., Kogoma M., Moriwaki T., Okazaki S. J. Phys. D: Appl. Phys. 1988, 21:838.
41. Eliasson B., Kogelschatz U. IEEE Trans. Plasma Sci. 1991, 19:309.
42. Kogelschatz U. Plasma Chem. Plasma Process. 2003, 23:1.
43. Hutchinson I.H. Principles of Plasma Diagnostics 2002, Cambridge University Press, Cambridge.
44. Low Temperature Plasma Physics: Fundamental Aspects and Applications 2001, Wiley-VCH, Berlin. R. Hippler, S. Pfau, M. Schmidt, K.H. Shoenbach (Eds.).
45. Chen F. Lecture Notes on Principles of Plasma Processing 2003, Kluwer Academic/Plenum Publishers, New York.
46. Donnelly V.M. J. Phys. D: Appl. Phys. 2004, 37:R217.
47. Kildemo M. Appl. Opt. 1998, 37:113.
48. Kildemo M., Bulkin P., Drevillon B., Hunderi O. Appl. Opt. 1997, 36:6352.
49. Applications of Piezoelectric Quartz Crystal Microbalances 1984, Elsevier, Amsterdam. C. Lu, A.W. Czanderna (Eds.).
50. Grill A. Cold Plasma in Materials Fabrication: From Fundamentals to Applications 1994, IEEE Press, New York.
51. Aguas H., Martins R., Fortunato E. Vacuum 2000, 56:31.
52. Spatenka P., Suhr H. Plasma Chem. Plasma Process. 1993, 13:555.
53. Zabeida O., Martinu L. J. Appl. Phys. 1999, 85:6366.
54. Zeuner M., Neumann H., Meichsner J. Vacuum 1997, 48:443.
55. Zabeida O., Hallil A., Wertheimer M.R., Martinu L. J. Appl. Phys. 2000, 88:635.
56. Hallil A., Zabeida O., Wertheimer M.R., Martinu L. J. Vac. Sci. Technol. A 2000, 18:882.
57. Hallil A., Zabeida O., Klemberg-Sapieha J.E., Wertheimer M.R., Martinu L. Proc. 42nd Annual Technical Conference 1999, 311. Society of Vacuum Coaters, Chicago, IL.
58. Roy R.A., Yee D.S. Handbook of Ion Beam Processing Technology 1989, 194. Noyes, Park Ridge, NJ. J.J. Cuomo, S.M. Rossnagel, H.R. Kaufman (Eds.).
59. Movchan B.A., Demchishin A.V. Fiz. Met. Metalloved. 1969, 28:653.
60. Thornton J.A. J. Vac. Sci. Technol. 1974, 11:666.
61. Messier R., Giri A.P., Roy R.A. J. Vac. Sci. Technol. A 1984, 2:500.
62. Messier R. J. Vac. Sci. Technol. A 1986, 4:490.
63. Kelly P.J., Arnell R.D. J. Vac. Sci. Technol. A 1998, 16:2858.
64. Musil J. Proceedings of 8th International Symposium on Elementary Processes and Chemical Reactions in Low Temperature Plasma 1992, 177.
65. Harper J.M.E., Cuomo J.J., Gambino R.J., Kaufman H.R. Ion Bombardment Modification of Surfaces 1989, 127. Elsevier, Amsterdam. O. Auciello, R. Kelly (Eds.).
66. Klemberg-Sapieha J.E., Oberste-Berghaus J., Martinu L., Blacker R., Stevenson I., Sadkhin G. Appl. Optics 2004, 43:2670.
67. Manenschijn A., Goedheer W.J. J. Appl. Phys. 1991, 69:2923.
68. Amassian A., Svec M., Desjardin P., Martinu L. J. Vac. Sci. Technol. A 2006, 24:2061.
69. Amassian A., Svec M., Desjardins P., Martinu L. J. Appl. Phys. 2006, 100:063526.
70. Jedrzejowski P., Amassian A., Bousser E., Klemberg-Sapieha J.E., Martinu L. Appl. Phys. Lett. 2006, 88:071915.
71. Wertheimer M.R., Fozza A.C., Hollander A. Nucl. Instrum. Methods Phys. Res. B 1999, 151:65.
72. Hollander A., Klemberg-Sapieha J.E., Wertheimer M.R. J. Polym. Sci. A, Polym. Chem. 1995, 33:2013.
73. Gujrathi S.C. Metallized Polymers, Vol. 440, ACS Symposium Series 1990, 88. ACS, Washington, DC. E. Sacher, J.J. Pireaux, S.P. Kowalczyk (Eds.).
74. Feldman L.C., Mayer J.W. Fundamentals of Surface and Thin Film Analysis 1986, North Holland, Elsevier Science, Amsterdam.
75. Surface and Thin Film Analysis: A Compendium of Principles, Instrumentation, and Applications 2002, Wiley-VCH, Weinheim. H. Bubert, H. Jenett (Eds.).
76. Ohring M. Materials Science of Thin Films 1992, Academic Press, New York.
77. Born M., Wolf E. Principles of Optics 1993, Pergamon, New York. 6th ed.
78. Urbach F. Phys. Rev. 1953, 89:1189.
79. Forouhi A.R., Bloomer I. Phys. Rev. B 1986, 34:7018.
80. Jellison G.E., Modine F.A. Appl. Phys. Lett. 1996, 69:371. Erratum 69 (1996) 2137.
81. Bruggeman D.A.G. Ann. Phys. Leipzig 1935, 24:636.
82. Stroud D. Phys. Rev. B 1975, 12:3368.
83. Electrical Transport and Optical Properties of Inhomogeneous Media, AIP Conf. Proc., Vol. 40 1978, AIP, New York. J.C. Garland, D.B. Tanner (Eds.).
84. Aspnes D.E. Chap. 5. Handbook of Optical Constants of Solids 1985, 89. Academic, San Diego, CA. E.D. Palik (Ed.).
85. Oliver W.C., Pharr G.M. J. Mater. Res. 1992, 7:1564.
86. Holmberg K., Matthews A. Coatings Tribology; Properties, Techniques and Applications in Surface Engineering 1998, Elsevier, New York.
87. Martinu L. Plasma Treatments and Deposition of Polymers 1997, 247. Kluwer Academic Publishers, Dordrecht. R. d'Agostino, P. Favia, F. Fracassi (Eds.).
88. Burnett P.J., Rickerby D.S. Thin Solid Films 1987, 154:403.
89. Stansbury E., Buchanan R. Fundamentals of Electrochemical Corrosion 2000, ASM International.
90. Azzi M., Szpunar J.A. Biomol. Eng. 2007, 24:443.
91. Eckertova L. Physics of Thin Films 1986, Springer, New York.
92. Kessels W.M.M., Smets A.H.M., Marra D.C., Aydil E.S., Schram D.C., van de Sanden M.C.M. Thin Solid Films 2001, 383:154.
93. Lucovsky G., Manitini M.J., Srivastava J.K., Irene E.A. J. Vac. Sci. Technol. B 1987, 5:530.
94. Devine R.A.B., Marchand M. Appl. Phys. Lett. 1993, 63:619.
95. Martin P.J., Netterfield R.P., Sainty W.G. J. Appl. Phys. 1984, 55:235.
96. Gupta A., Toby S., Gusev E.P., Lu H., Li Y., Green M.L. Prog. Surf. Sci. 1998, 59:103.
97. Ricard A., Oseguera-Pena J.E., Falk L., Michel H., Gantois M. IEEE Trans. Plasma Sci. 1996, 18:940.
98. Hsieh W., Chang C.Y., Hsu S.C. J. Appl. Phys. 1993, 74:2638.
99. Han S.M., Aydil E.S. J. Vac. Sci. Technol. A 1996, 14:2062.
100. Bertrand N., Drevillon B., Bulkin P. J. Vac. Sci. Technol. A 1998, 16:63.
101. Watanabe Y., Shiratani M. Jpn. J. Appl. Phys. Part 1 1993, 32:3074.
102. Love A., Middleman S., Hochberg A.K. J. Cryst. Growth 1993, 129:119.
103. Shamiryan D., Abell T., Iacopi F., Maex K. Mater. Today 2004, 7:34.
104. Han S.M., Aydil E.S. J. Appl. Phys. 1998, 83:2172.
105. Vallee C., Goullet A., Nicolazo F., Granier A., Turban G. J. Non-Cryst. Solids 1997, 311:212.
106. Robertson J. Philos. Mag. B 1991, 63:47.
107. Poitras D., Leroux P., Klemberg-Sapieha J.E., Gujrathi S.C., Martinu L. Opt. Eng. 1996, 35:2693.
108. Fracassi F., d'Agostino R., Bruno G. Plasmas Polymers 1996, 1:3.
109. Vernhes R., Zabeida O., Amassian A., Klemberg-Sapieha J.E., Martinu L. Appl. Optics 2004, 43:97.
110. Tompkins H.G., Gregory R.B., Deal P.W., Smith S.M. J. Vac. Sci. Technol. A 1999, 17:391.
111. Martinu L. Functional Photonic and Fiber Devices 1994, Vol. 2695:30. SPIE, Bellingham, WA.
112. Klemberg-Sapieha J.E., Martinu L., Wertheimer M.R., Günther P., Schellin R., Thielemann C., Sessler G. J. Vac. Sci. Technol. A 1996, 14:2775.
113. Hattori T., Semura S., Akasaka N. Jpn. J. Appl. Phys. Part 1 1999, 38:2775.
114. Tseng W.-T., Hsieh Y.-T., Lin C.-F., Tsai M.-S., Feng M.-S. J. Electrochem. Soc. 1997, 144:1100.
115. Badzian A., Badzian T., Roy R., Drawl W. Thin Solid Films 1999, 354:148.
116. He Z., Carter G., Colligon J.S. Thin Solid Films 1996, 283:90.
117. Wrobel A.M., Walkiewicz-Pietrzykowska A., Klemberg-Sapieha J.E., Nakanishi Y., Aoki T., Hatanaka Y. Chem. Mater. 2002, 15:1749.
118. Jedrzejowski P., Cizek J., Klemberg-Sapieha J.E., Vlcek J., Martinu L. Thin Solid Films 2004, 447-448:201.
119. Davis R.F. Diamond Films and Coatings - Development, Properties and Applications 1993, Noyes, Park Ridge, NJ.
120. Robertson J. Mater. Sci. Eng. 2002, R37:129.
121. Diamond and Diamond-Like Films and Coatings 1991, Plenum, New York. R. Clausing, L. Horton, J. Angus, P. Koidl (Eds.).
122. Properties and Characterization of Amorphous Carbon Films, Materials, Science Forum, Vols. 52-53, Trans. -Tech. 1990, Aedermannsdorf, Switzerland. J. Pouch, S.A. Alterovitz (Eds.).
123. Raveh A., Martinu L., Gujrathi S.C., Klemberg-Sapieha J.E., Wertheimer M.R. Surf. Coat. Technol. 1992, 53:275.
124. Houska J., Klemberg-Sapieha J.E., Martinu L. Surf. Coat. Technol. 2009, 203:3770.
125. Hellgren N., Johansson M.P., Broitman E., Hultman L., Sundgren J.-E. Phys. Rev. B 1999, 59:5162.
126. Sah R.E., Dischler B., Bubenzer A., Koidl P. Appl. Phys. Lett. 1985, 46:739.
127. Lusk D., Gore M., Boardman W., Casserly T., Boinapally K., Oppus M. Diamond Relat. Mater. 2008, 17:1613.
128. Diamond: Electronic Properties and Applications 1995, Kluwer Academic, Dordrecht. L.S. Pan, D.R. Kania (Eds.).
129. Applications of Diamond Films and Related Materials 1995, Vol. 885. National Institute of Standards and Technology, Washington, DC.
130. Borges C.F.M., Moisan M., Gicquel A. Diamond Relat. Mater. 1995, 4:149.
131. Zhang W.J., Chong Y.M., Bello I., Lee S.T. J. Phys. D: Appl. Phys. 2007, 40:6159.
132. Chan C.Y., Zhang W.J., Matsumoto S., Bello I., Lee S.T. J. Crystal Growth 2003, 247:438.
133. Li H.Q., Leung K.M., Ma K.L., Ye Q., Chong Y.M., Zou Y.S. Appl. Phys. Lett. 2007, 91:201918.
134. Biederman H. Plasma Polymer Films 2004, Imperial College Press.
135. Alptekin A., Sacher E., Czeremuszkin G., Martinu L., DiRenzo M. Electrochem. Soc. Proc. 1998, 97-8:58.
136. Butoi C.I., Mackie N.M., Barnd J.L., Fisher E.R. Chem. Mater. 1999, 11:862.
137. Zhang D., Kushner M.J. J. Vac. Sci. Technol. A 2001, 19:524.
138. Kay E., Coburn J., Dilks A. Top. Curr. Chem. 1980, 94:1.
139. Labelle C.B., Gleason K.K. J. Vac. Sci. Technol. A 1999, 17:445.
140. Weber A., Pochelmann R., Klages C.-P. J. Vac. Sci. Technol. A 1998, 16:2120.
141. Hetzler U., Kay E. J. Appl. Phys. 1978, 49:5617.
142. Martinu L., Biederman H., Nedbal J. Thin Solid Films 1986, 136:11.
143. Martinu L., Klemberg-Sapieha J.E. Optical Interference Coatings 2003, 359. Springer. N. Kaiser, H.K. Pulker (Eds.).
144. Lee Y.H., Chan K.K., Brady M.J. J. Vac. Sci. Technol. A 1995, 13:596.
145. Lee Y.H. Vacuum 1998, 51:503.
146. Larouche S., Szymanowski H., Klemberg-Sapieha J.E., Martinu L., Gujrathi S.C. J. Vac. Sci. Technol. A 2004, 22:1200.
147. Szymanowski H., Zabeida O., Klemberg-Sapieha J.E., Martinu L. J. Vac. Sci. Technol. A 2005, 23:241.
148. Masse J.-P., Szymanowski H., Zabeida O., Amassian A., Klemberg-Sapieha J.E., Martinu L. Thin Solid Films 2006, 515:1674.
149. Arefi-Khonsari F., Hellegouarc'h F., Amouroux J. J. Vac. Sci. Technol. A 1998, 16:2240.
150. Lee J.H., Kim D.S., Lee Y.H. J. Electrochem. Soc. 1996, 143:1443.
151. Itoh K., Matsumoto O. Thin Solid Films 1999, 345:29.
152. Gato T., Zhang W., Hirai T. Jpn. J. Appl. Phys. Part 1 1999, 38:3668.
153. Patscheider J., Veprek S. Plasma Chem. Plasma Process. 1992, 12:129.
154. Chryssou C.E., Pitt C.W. IEEE J. Quantum Electron. 1998, 34:282.
155. Henley W.B., Sacks G.J. J. Electrochem. Soc. 1997, 144:1045.
156. Seman M., Wolden C.A. J. Vac. Sci. Technol. A 2003, 21:1927.
157. Granqvist C.G. Solar Energy Mater. Solar Cells 2000, 60:201.
158. Seman M., Wolden C.A. Solar Energy Mater. Solar Cells 2004, 82:517.
159. Kreibig U., Zacharias P. Z. Phys. 1970, 231:128.
160. Ricard D., Roussignol P., Flytzanis C. Opt. Lett. 1985, 10:511.
161. Hache F., Ricard D., Flytzanis C., Kreibig U. Appl. Phys. A: Solids Surf. 1988, 47:347.
162. Liao H.B., Xiao R.F., Fu J.S., Wang H., Wong K.S., Wong G.K.L. Opt. Lett. 1998, 23:388.
163. Lamarre J.-M., Billard F., Harkati-Kerboua C., Lequime M., Roorda S., Martinu L. Opt. Commun. 2008, 281:331.
164. Veprek S. J. Vac. Sci. Technol. A 1999, 17:2401.
165. Voevodin A.A., O'Neill J.P., Zabinski J.S. Surf. Coat. Technol. 1999, 116-119:36.
166. Musil J. Surf. Coat. Technol. 2000, 125:322.
167. Jedrzejowski P., Baloukas B., Klemberg-Sapieha J.E., Martinu L. J. Vac. Sci. Technol. A 2004, 22:725.
168. Holleck H. Surface Engineering: Science and Technology I 1999, 207. Minerals, Metals and Materials Society. A. Kumar, Y.W. Chung, J.J. Moore, J.E. Smugeresky (Eds.).
169. Veprek S., Argon A.S. Surf. Coat. Technol. 2001, 146-147:175.
170. Patscheider J., Zehnder T., Diserens M. Surf. Coat. Technol. 2001, 146:201.
171. Jedrzejowski P., Klemberg-Sapieha J.E., Martinu L. Thin Solid Films 2003, 426:150.
172. Jedrzejowski P., Klemberg-Sapieha J.E., Martinu L. Thin Solid Films 2004, 466:189.
173. Hultman L., Bareño J., Flink A., Söderberg H., Larsson K., Petrova V. Phys. Rev. B 2007, 75:155437.
174. Houska J., Klemberg-Sapieha J.E., Martinu L. Surf. Coat. Technol. 2009, 203:3348.
175. Zukerman I., Raveh A., Landu Y., Weiss R., Shneck R., Shneor Y., et al. Surf. Coat. Technol. 2007, 201:6171.
176. Bell T., Dong H., Sun Y. Tribol. Int. 1998, 31:127.
177. Snyders R., Bousser E., Amireault P., Klemberg-Sapieha J.E., Park E., Taylor K. Plasma Process. Polym. 2007, 4:S640.
178. Campillo C., Illias S., Borges C.F.M., Moisan M., Martinu L. New Diamond Front Carbon Technol. 2001, 11:147.
179. Azzi M., Paquette M., Szpunar J.A., Klemberg-Sapieha J.E., Martinu L. Wear 2009, 267:860.
180. Wertheimer M.R., Martinu L., Klemberg-Sapieha J.E., Czeremuszkin G. Adhesion Promotion Techniques 1999, 139. Marcel Dekker, New York. K.L. Mittal, L. Pizzi (Eds.).
181. Klemberg-Sapieha J.E., Poitras D., Martinu L., Yamasaki N.L.S., Lantman C.W. J. Vac. Sci. Technol. A 1997, 15:985.
182. Da Silva-Sobrinho A.S., Latrèche M., Czeremuszkin G., Klemberg-Sapieha J.E., Wertheimer M.R. J. Vac. Sci. Technol. A 1998, 16:3190.
183. Klemberg-Sapieha J.E., Martinu L., Yamasaki N.L.S., Lantman C.W. Thin Solid Films 2005, 476:101.
184. Bergeron A., Klemberg-Sapieha J.E., Martinu L. J. Vac. Sci. Technol. A 1998, 16:3227.
185. Da Silva Sobrinho A.S., Schühler N., Klemberg-Sapieha J.E., Wertheimer M.R., Andrews M., Gujrathi S.C. J. Vac. Sci. Technol. A 1998, 16:2021.
186. Bergeron A., Poitras D., Martinu L. Opt. Eng. 2000, 39:825.
187. Dahl S., Rats D., von Stebut J., Martinu L., Klemberg-Sapieha J.E. Thin Solid Films 1999, 355-356:290.
188. Handbook of Thin-film Deposition Processes and Techniques: Principles, Methods, Equipment and Applications 2002, William Andrew. K. Seshan (Ed.).
189. Chu P.K., Chen J.Y., Wang L.P., Huang N. Mater. Sci. Eng. 2002, R36:143.
190. Liang H., Shi B., Fairchild A., Cale T. Vacuum 73 2004, 317.
191. Sit J.C., Vick D., Robbie K., Brett M.J. J. Mater. Res. 1999, 14:1197.
192. Vernhes R., Zabeida O., Klemberg-Sapieha J.E., Martinu L. Appl. Opt. 2004, 43:97.
193. Bohling D., Coda M., Blacker R., Burton C., Gove R., Murphy P. Proc. 43rd Annu. Tech. Conf. of the SVC 2000, 222.
194. Hora R., Wohlrab C. Proc. 36th Annu. Tech. Conf. of the SVC 1993, 51.
195. Beckmann R., Nauenberg K.D., Naumann T., Patz U., Ieked G., Hagedorn H. Proc. 44th Annu. Tech. Conf. of the Society of Vacuum Coaters (SVC) 2001, 288.
196. Blees M.H., Winkelman G.B., Balkenende A.R., den Toonder J.M.J. Thin Solid Films 2000, 359:1.
197. Dobrowolski J.A. Chap. 42. Optical Society of America's Handbook of Optics 1995, McGraw-Hill, New York. M. Bass (Ed.).
198. Pongratz S., Zöller A. J. Vac. Sci. Technol. A 1992, 10:1897.
199. Schulz U., Schallenberg U.B., Kaiser N. Appl. Opt. 2002, 41:3107.
200. Poitras D., Martinu L. Appl. Opt. 2000, 39:1168.
201. Klemberg-Sapieha J.E., Martinu L., Fridman V., Morton D.E. Proc. of the 41st Annu. Tech. Conf. of Society of Vacuum Coaters (SVC) 1998, 138.
202. Greenham A.C., Nichols B.A., Wood R.M., Nourshargh N., Lewis K.L. Opt. Eng. 1993, 32:1018.
203. Swart P.L., Bulkin P.V., Lacquet B.M. Opt. Eng. 1997, 36:1215.
204. Vernhes R., Amassian A., Klemberg-Sapieha J.E., Martinu L. J. Appl. Phys. 2006, 99:114315.
205. Poitras D., Larouche S., Martinu L. Appl. Opt. 2002, 41:5249.
206. Larouche S., Martinu L. Appl. Opt. 2008, 47:4321.
207. Rats D., Poitras D., Soro J.M., Martinu L., von Stebut J. Surf. Coat. Technol. 1999, 111:220.
208. Rats D., Soro J.M., Martinu L., von Stebut J. Surf. Coat. Technol. 2000, 123:36.
209. R. Vernhes, PhD Thesis, École Polytechnique de Montréal, Montréal, Québec, Canada, 2006.
210. Mir J.M., Agostinelli J.A. J. Vac. Sci. Technol. A 1994, 12:1439.
211. Worhoff K., Lambeck P.V., Driessen A. J. Lightwave Technol. 1999, 17:1401.
212. Bruno F., del Guidice M., Recca R., Testa F. Appl. Opt. 1991, 30:4560.
213. Giroult-Matlakowski G., Charles C., Durandet A., Boswell R.W., Armand S., Persing H.M., et al. J. Vac. Sci. Technol. A 1994, 12:2754.
214. Hoffmann M., Kopka P., Voges E. IEEE Photonics Technol. Lett. 1997, 9:1238.
215. Wirges W., Bauer-Gogonea S., Bauer S., Gerhard-Multhaupt R., Martinu L., Klemberg-Sapieha J.E., Wertheimer M.R. Proc. SPIE 1994, 2213:303.
216. Wagner C., Frankenberger J., Deimel P.P. IEEE Photonics Technol. Lett. 1993, 5:1257.
217. Lam D.K.W. Appl. Opt. 1984, 23:2744.
218. Yokoyama S., Nagata A.T., Kuroda Y., Doi T., Namba T., Miyake K. J. Vac. Sci. Technol. A 1995, 13:629.
219. Malek-Tabrizi A., Najafi S.I., Martinu L. Functional Photonic and Fiber Devices 1996, Vol. 2695:180. SPIE, Bellingham, WA.
220. Beltrami D.R., Love J.D., Durandet A., Samoc A., Cogswell C.J. Appl. Opt. 1997, 36:7143.
221. Mahan A.H. Solar Energy Mater. Solar Cell 2003, 78:299.
222. Guha S., Yang J. J. Non-Cryst. Solids 2006, 352:1917.
223. Shah A.V., Meier J., Vallat-Sauvain E., Wyrsch J., Kroll U., Droz C., Graf U. Solar Energy Mater. Solar Cells 2003, 78:469.
224. Guha S., Yang J., Banerjee A., Yan B., Lord K. Solar Energy Mater. Solar Cells 2003, 78:329.
225. Vetterl O., Finger F., Carius R., Hapke P., Houben L., Kluth O. Solar Energy Mater. Solar Cells 2000, 62:97.
226. Yang J., Banerjee A., Guha S. Solar Energy Mater. Solar Cells 2003, 78:597.
227. M. Zeuner, Private communication.
228. Chatham H. Surf. Coat. Technol. 1996, 78:1.
229. Schühler N., da Silva Sobrinho A.S., Klemberg-Sapieha J.E., Andrews M., Wertheimer M.R.S. Proc. 39th Annu. Tech. Conf. of the Society of Vacuum Coaters (SVC) 1996, 285.
230. Da Silva Sobrinho A.S., Czeremuszkin G., Latrèche M., Wertheimer M.R. J. Vac. Sci. Technol. A 2000, 18:149.
231. Affinito J.D., Gross M.E., Coronado C.A., Graff G.L., Greenwell E.N., Martin P.M. Proc. 39th Annu. Tech. Conf. of the Society of Vacuum Coaters (SVC) 1996, 397.
232. Gross M.E., Martin P.M., Olsen L.C., Graff G.L., Burrows P.E., Bonham C.C., et al. Proc. 46th Annu. Tech. Conf. of the Society of Vacuum Coaters (SVC) 2003, 89.
233. Madocks J., Rewhinkle J., Barton L. Mater. Sci. Eng. B 2005, 119:268-273.
234. Granqvist C.G. Solar Energy Mater. Solar Cells 2008, 92:203.
235. Ellison T., Dotter B., Izu M., Ovshinsky S. Proc. 40th Annu. Tech. Conf. of the Society of Vacuum Coaters (SVC) 1997, 309.
236. Garg D., Henderson P.B., Hollingsworth R.E., Jensen D.G. Mater. Sci. Eng. B 2005, 119:224.
237. Guruvenket S., Li D., Klemberg-Sapieha J.E., Martinu L., Szpunar J. Surf. Coat. Technol. 2009, 203:2905.
238. Cheng Y.T., Cheng C.M. Appl. Phys. Lett. 1998, 73:614.
239. Leyland A., Matthews A. Wear 2000, 246:1.
240. Musil J., Jirout M. Surf. Coat. Technol. 2007, 210:5148.
241. Galvan D., Pei Y.T., De Hosson J.T.M. Surf. Coat. Technol. 2006, 200:6718.
242. Hassani S., Bielawski M., Beres W., Martinu L., Balazinski M., Klemberg-Sapieha J.E. Surf. Coat. Technol. 2008, 203:204.
243. J.E. Klemberg-Sapieha, L. Martinu et al., unpublished.
244. Hassani S., Klemberg-Sapieha J.E., Bielawski M., Beres W., Martinu L., Balazinski M. Wear 2008, 265:879.
245. Tribology of Diamond-Like Carbon Films: Fundamentals and Applications 2008, Springer, New York. C. Donnet, A. Erdemir (Eds.).
246. Butter R., Allen M., Chandra L., Lettington A.H., Rushton N. Diamond Relat. Mater. 1995, 4:857.
247. Sinnet-Jones P.E., Wharton J.A., Wood R.J.K. Wear 2005, 259:898.
248. Shanbhag A.S., Jacobs J.J., Black J., Galante J.O., Glant T.T. J. Biomed. Mater. Res. 1994, 28:81.
249. Hildebrand H.F., Hornez J.-C., Helsen J.A.H. Chap. 9. Biological Response and Biocompatibility 1998, John Wiley and Sons. J. Breme (Ed.).
250. O. Zabeida, J.E. Klemeberg-Sapieha, L. Martinu, unpublished.
251. Lawes S.D.A., Fitzpatrick M.E., Hainsworth S.V. J. Phys. D.: Appl. Phys. 2007, 40:5427.