Deposition process of metal oxide thin films by means of plasma CVD with β-diketonates as precursors

Thin Solid Films

Volumn 345, Issue 1, 1999, Pages 29-33

  Itoh, Ken ichi ^a   Matsumoto, Osamu ^a  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; ELECTROLYTES; EMISSION SPECTROSCOPY; KETONES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; ZIRCONIA;

DIKETONATES; METAL OXIDE THIN FILMS; OPTICAL EMISSION SPECTROSCOPY;

OXIDES;

EID: 0033531831     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00099-1     Document Type: Article

References (19)

1. Tiitta M., Niinisto L. Chem. Vap. Deposit. 3:1997;167.
2. Errington R.J. Advanced Practical Inorganic and Metalorganic Chemistry. Chapman&Hall, London, , p. 1997;251.
3. Uyama H., Oka N., Ono I., Matsumoto O. Denki Kagaku. 58:1990;564.
4. Chiba T., Itoh K., Matsumoto O. Thin Solid Films. 300:1997;6.
5. Itoh K., Okunishi M., Fujimoto E., Matsumoto O. Proc. 13th Int. Symp. Plasma Chem. 1997;1177.
6. Itoh K., Matumoto K., Matsumoto O. Proc. 14th Int. Conf. Chemical Vapour Deposition. 1997;1238.
7. Nicoloso N., Lobert A., Leibold B. Sensors Actuators B. 8:1992;253.
8. -K Y. Lee, J.-W. Park, J. Mater. Sci. Lett. 15:1996;1513.
9. Yamane H., Hirai T. J. Cryst. Growth. 94:1989;880.
10. Dixon J.M., LaGrange L.D., Merten U., Miller C.F., Porter J.T. II. J. Electrochem. Soc. 110:1963;276.
11. Buchanan R.C., Pope S. J. Electrochem. Soc. 130:1983;962.
12. Woehlecke M., Marrello V., Onton A. J. Appl. Phys. 48:1977;1748.
13. Kim T.W., Jung M., Yoon Y.S., Kang W.N., Shin H.S., Yom S.S., Lee J.Y. Solid State Commun. 86:1993;565.
14. W.L. Wiese, M.W. Smith, B.M. Glennon, Atomic Transition Probabilities Vol. 1, National Bureau of Standards, 1966.
15. Harrison G.R. Wave Length Table. 1939;Wiley, New York.
16. Rearse R.W.B., Gaydon A.G. The Identification of Molecular Spectra. 1976;Chapman&Hall, London.
17. Fracassi F., d'Agostino R., Favia P. J. Electrochem. Soc. 139:1992;2636.
18. Janca J., Talsky A., Zvonicek V. Plasma Chem. Plasma Process. 16:1996;187.
19. Suhr H. Plasma Chem. Plasma Process. 9:1989;7s.