Influence of gas flow dynamics on discharge stability and on the uniformity of atmospheric pressure PECVD thin film

Journal of Physics D: Applied Physics

Volumn 42, Issue 12, 2009, Pages

  Caquineau, H ^a,b   Enache, I ^a,b   Gherardi, N ^a,b   Naude N ^a,b   Massines, F ^c  

^a d'Hydraulique et des Telecommunications   (France)

^b CNRS   (France)

^c PROMES CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE PLASMAS; DEPOSIT UNIFORMITY; DIELECTRIC BARRIER DISCHARGES; DISCHARGE CELLS; DISCHARGE INSTABILITIES; DISCHARGE STABILITY; DISCHARGE ZONE; ELECTRON DEPLETION; GAS FLOW DYNAMICS; GAS FLOWS; GAS RECIRCULATIONS; LAYER UNIFORMITY; NITROUS OXIDE; NONUNIFORMITY; NUMERICAL SIMULATION; POWDER FORMATION; RECIRCULATION ZONES; RECIRCULATIONS;

AERODYNAMICS; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC MOVEMENTS; ATMOSPHERIC PRESSURE; CELL MEMBRANES; COMPUTATIONAL FLUID DYNAMICS; COMPUTER SIMULATION; DEPOSITION; FILM THICKNESS; FLOW OF GASES; FLOW SIMULATION; GASES; NITROGEN OXIDES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; POWDERS; SILANES; SILICA; SUBSTRATES; THIN FILM DEVICES; THIN FILMS;

GAS PERMEABLE MEMBRANES;

EID: 70249099250     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/12/125201     Document Type: Article

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