Role of the bias voltage during the deposition of thin tin oxide films by plasma assisted chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 4, 1998, Pages 2240-2244

  Arefi Khonsari, F ^a   Hellegouarc'h, F ^a   Amouroux, J ^a  

^a SORBONNE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032336856     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581333     Document Type: Article

References (17)

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