Mechanical properties of plasma-deposited silicon-based inhomogeneous optical coatings

Surface and Coatings Technology

Volumn 111, Issue 2-3, 1999, Pages 220-228

  Rats, D ^a,b   Poitras, D ^a   Soro, J M ^b   Martinu, L ^a   Von Stebut, J ^b  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

^b INSTITUT JEAN LAMOUR   (France)

Author keywords

Graded index structure; Micro hardness test; Microscratch test; Optical coatings; Plasma enhanced chemical vapour deposition

Indexed keywords

AMORPHOUS MATERIALS; CERAMIC COATINGS; COMPOSITION EFFECTS; ELLIPSOMETRY; HYDROGENATION; INDENTATION; MICROWAVES; OPTICAL FILTERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SILICON NITRIDE; SPECTROPHOTOMETRY; STRENGTH OF MATERIALS; TOUGHNESS; AMORPHOUS FILMS; GRADIENT INDEX OPTICS; HARDNESS TESTING; MICROHARDNESS; OPTICAL FILMS; OPTICAL MULTILAYERS; OPTICAL PROPERTIES;

SILICON OXYNITRIDE; SPECTROSCOPIC ELLIPSOMETRY; DEPTH-SENSING INDENTATION TESTS; MICROSCRATCH TESTS; SILICON OXIDE;

OPTICAL COATINGS;

OPTICAL INSTRUMENT;

EID: 0032626630     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00812-3     Document Type: Article

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