Dynamics of ion bombardment-induced modifications of Si(001) at the radio-frequency-biased electrode in low-pressure oxygen plasmas: In situ spectroscopic ellipsometry and Monte Carlo study

Journal of Applied Physics

Volumn 100, Issue 6, 2006, Pages

  Amassian, A ^a,b   Svec, M ^a,c   Desjardins, P ^a   Martinu, L ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

^b Cornell University   (United States)

^c J E PURKINJE UNIVERSITY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

DAMAGE FORMATION; ION SURFACE INTERACTIONS; OXYGEN PLASMAS; REAL TIME SPECTROSCOPIC ELLIPSOMETRY (RTSE);

CHEMICAL MODIFICATION; ELECTROCHEMICAL ELECTRODES; ELLIPSOMETRY; ION BOMBARDMENT; MONTE CARLO METHODS; OPTICAL COATINGS; PLASMA APPLICATIONS;

SILICON;

EID: 33749349886     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2337260     Document Type: Article

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