Pulsed plasma-enhanced chemical vapor deposition from CH2F2, C2H2F4, and CHClF2

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 2, 1999, Pages 445-452

  Labelle, Catherine B ^a   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033440283     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581604     Document Type: Article

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