A role of energetic ions in RF-biased PECVD of TiO2

Vacuum

Volumn 51, Issue 4, 1998, Pages 503-509

  Lee, Young Hoon ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DENSIFICATION; DIFFUSION; FILM GROWTH; HIGH TEMPERATURE EFFECTS; ION BOMBARDMENT; LEAKAGE CURRENTS; PERMITTIVITY; PHASE TRANSITIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPUTTER DEPOSITION; THIN FILMS;

ADATOMS;

TITANIUM DIOXIDE;

EID: 0032318763     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00242-5     Document Type: Article

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