Mass-resolved ion energy distributions in continuous dual mode microwave/radio frequency plasmas in argon and nitrogen

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 3, 2000, Pages 882-890

  Hallil, A ^a   Zabeida, O ^a   Wertheimer, M R ^a   Martinu, L ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; IONS; NITROGEN; PHOTONS; PLASMA DENSITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SHEATHS;

ION ENERGY DISTRIBUTION FUNCTIONS (IEDF);

PLASMA INTERACTIONS;

EID: 0034187139     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582271     Document Type: Article

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