Plasma diagnostics of a PECVD system using different R.F. electrode configurations

Vacuum

Volumn 56, Issue 1, 2000, Pages 31-37

  Aguas H ^a   Martins, R ^a   Fortunato, E ^a  

^a UNIVERSIDADE NOVA DE LISBOA   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; ELECTRIC IMPEDANCE; ELECTRODES; ION BOMBARDMENT; MATHEMATICAL MODELS; PLASMA DIAGNOSTICS; PLASMA PROBES;

LANGMUIR PROBE; SHORT-CIRCUITED GRID ELECTRODE (SGE);

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0033908301     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(99)00157-8     Document Type: Article

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