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Volumn 35, Issue 9, 1996, Pages 2693-2699

Characterization of homogeneous and inhomogeneous Si-based optical coatings deposited in dual-frequency plasma

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EID: 0000445848     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.600833     Document Type: Article
Times cited : (24)

References (15)
  • 1
    • 85076115758 scopus 로고
    • A review of the optical properties of inhomogeneous thin films
    • R. Jacobsson, "A review of the optical properties of inhomogeneous thin films," Proc. SPIE 2046, 2-8 (1993).
    • (1993) Proc. SPIE , vol.2046 , pp. 2-8
    • Jacobsson, R.1
  • 2
    • 0009968458 scopus 로고
    • Inhomogeneous and coevaporated homogeneous films for optical applications
    • R. Jacobsson, "Inhomogeneous and coevaporated homogeneous films for optical applications," Phys. of Thin Films 8, 51-98 (1975).
    • (1975) Phys. of Thin Films , vol.8 , pp. 51-98
    • Jacobsson, R.1
  • 3
    • 84975604837 scopus 로고
    • Gradient-index antireflection coatings
    • W. H. Southwell, "Gradient-index antireflection coatings," J. Opt. Lett. 8, 584-586 (1983).
    • (1983) J. Opt. Lett. , vol.8 , pp. 584-586
    • Southwell, W.H.1
  • 4
    • 85076120839 scopus 로고
    • Introduction to Rugate filter technology
    • W. E. Johnson and R. L. Crane, "Introduction to Rugate filter technology," Proc. SPIE 2046, 88-108 (1993).
    • (1993) Proc. SPIE , vol.2046 , pp. 88-108
    • Johnson, W.E.1    Crane, R.L.2
  • 5
    • 0000493335 scopus 로고
    • Inhomogeneous optical coatings: An experimental study of a new approach
    • R. W. Bertram, M. F. Ouellette, and P. Y. Tse, "Inhomogeneous optical coatings: an experimental study of a new approach," Appl. Opt. 28(14), 2935-2939 (1989).
    • (1989) Appl. Opt. , vol.28 , Issue.14 , pp. 2935-2939
    • Bertram, R.W.1    Ouellette, M.F.2    Tse, P.Y.3
  • 7
    • 21144481440 scopus 로고
    • Graded refractive index silicon oxynitride thin film characterized by spectroscopic ellipsometry
    • P. G. Snyder, Y. Xiong, J. A. Woollam, G. A. Al-Jumaily, and F. J. Gagliardi, "Graded refractive index silicon oxynitride thin film characterized by spectroscopic ellipsometry," J. Vac. Sci. Technol. A10(4), 1462 (1992).
    • (1992) J. Vac. Sci. Technol. , vol.A10 , Issue.4 , pp. 1462
    • Snyder, P.G.1    Xiong, Y.2    Woollam, J.A.3    Al-Jumaily, G.A.4    Gagliardi, F.J.5
  • 10
    • 0027885503 scopus 로고
    • Inhomogeneous dielectrics grown by plasma-enhanced chemical vapor deposition
    • S. Lim, J. H. Rym, J. F. Wager, and L. M. Cacas, "Inhomogeneous dielectrics grown by plasma-enhanced chemical vapor deposition," Thin Solid Films 236, 64-66 (1993).
    • (1993) Thin Solid Films , vol.236 , pp. 64-66
    • Lim, S.1    Rym, J.H.2    Wager, J.F.3    Cacas, L.M.4
  • 11
    • 0347523627 scopus 로고
    • Properties of multilayer and graded index Si-based coatings deposited in dual-frequency plasma
    • D. Poitras, J. E. Klemberg-Sapieha, A. Moussi, and L. Martinu, "Properties of multilayer and graded index Si-based coatings deposited in dual-frequency plasma," Proc. SPIE 2046, 179-188 (1993).
    • (1993) Proc. SPIE , vol.2046 , pp. 179-188
    • Poitras, D.1    Klemberg-Sapieha, J.E.2    Moussi, A.3    Martinu, L.4
  • 12
    • 0000894746 scopus 로고
    • Dualmode microwave/radio frequency plasma deposition of dielectric thin films
    • L. Martinu, J. E. Klemberg-Sapieha, and M. R. Wertheimer, "Dualmode microwave/radio frequency plasma deposition of dielectric thin films," Appl. Phys. Lett. 54, 2645-2647 (1989).
    • (1989) Appl. Phys. Lett. , vol.54 , pp. 2645-2647
    • Martinu, L.1    Klemberg-Sapieha, J.E.2    Wertheimer, M.R.3
  • 14
    • 0041898242 scopus 로고
    • Ion assisted thin film growth in dual microwave/radio frequency plasmas
    • Plasma Properties, Deposition and Etching, J. Pouch S. A. Alterovitz, Trans.-Tech. Publ., Aedermannsdorf, Switzerland
    • L. Martinu and M. R. Wertheimer, "Ion assisted thin film growth in dual microwave/radio frequency plasmas," in Plasma Properties, Deposition and Etching, J. Pouch and S. A. Alterovitz, Eds., Materials Science Forum, Vols. 140 to 142, pp. 405-420, Trans.-Tech. Publ., Aedermannsdorf, Switzerland (1993).
    • (1993) Materials Science Forum , vol.140-142 , pp. 405-420
    • Martinu, L.1    Wertheimer, M.R.2
  • 15
    • 84967881234 scopus 로고
    • Critical ion energy and ion flux in the growth of films by plasma-enhanced chemical-vapor deposition
    • L. Martinu, J. E. Klemberg-Sapieha, O. M. Küttel, A. Raveh, and M. R. Wertheimer, "Critical ion energy and ion flux in the growth of films by plasma-enhanced chemical-vapor deposition," J. Vac. Sci. Technol. A12, 1360-1364 (1994).
    • (1994) J. Vac. Sci. Technol. , vol.A12 , pp. 1360-1364
    • Martinu, L.1    Klemberg-Sapieha, J.E.2    Küttel, O.M.3    Raveh, A.4    Wertheimer, M.R.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.