-
1
-
-
85076115758
-
A review of the optical properties of inhomogeneous thin films
-
R. Jacobsson, "A review of the optical properties of inhomogeneous thin films," Proc. SPIE 2046, 2-8 (1993).
-
(1993)
Proc. SPIE
, vol.2046
, pp. 2-8
-
-
Jacobsson, R.1
-
2
-
-
0009968458
-
Inhomogeneous and coevaporated homogeneous films for optical applications
-
R. Jacobsson, "Inhomogeneous and coevaporated homogeneous films for optical applications," Phys. of Thin Films 8, 51-98 (1975).
-
(1975)
Phys. of Thin Films
, vol.8
, pp. 51-98
-
-
Jacobsson, R.1
-
3
-
-
84975604837
-
Gradient-index antireflection coatings
-
W. H. Southwell, "Gradient-index antireflection coatings," J. Opt. Lett. 8, 584-586 (1983).
-
(1983)
J. Opt. Lett.
, vol.8
, pp. 584-586
-
-
Southwell, W.H.1
-
4
-
-
85076120839
-
Introduction to Rugate filter technology
-
W. E. Johnson and R. L. Crane, "Introduction to Rugate filter technology," Proc. SPIE 2046, 88-108 (1993).
-
(1993)
Proc. SPIE
, vol.2046
, pp. 88-108
-
-
Johnson, W.E.1
Crane, R.L.2
-
5
-
-
0000493335
-
Inhomogeneous optical coatings: An experimental study of a new approach
-
R. W. Bertram, M. F. Ouellette, and P. Y. Tse, "Inhomogeneous optical coatings: an experimental study of a new approach," Appl. Opt. 28(14), 2935-2939 (1989).
-
(1989)
Appl. Opt.
, vol.28
, Issue.14
, pp. 2935-2939
-
-
Bertram, R.W.1
Ouellette, M.F.2
Tse, P.Y.3
-
6
-
-
84957225491
-
Experimental study of inhomogeneous coatings for optical application
-
M. F. Ouellette, R. W. Lang, K. L. Van, R. W. Bertram, R. S. Owles, and D. Vincent, "Experimental study of inhomogeneous coatings for optical application," J. Vac. Sci. Technol. A9(3), 1188-1192 (1991).
-
(1991)
J. Vac. Sci. Technol.
, vol.A9
, Issue.3
, pp. 1188-1192
-
-
Ouellette, M.F.1
Lang, R.W.2
Van, K.L.3
Bertram, R.W.4
Owles, R.S.5
Vincent, D.6
-
7
-
-
21144481440
-
Graded refractive index silicon oxynitride thin film characterized by spectroscopic ellipsometry
-
P. G. Snyder, Y. Xiong, J. A. Woollam, G. A. Al-Jumaily, and F. J. Gagliardi, "Graded refractive index silicon oxynitride thin film characterized by spectroscopic ellipsometry," J. Vac. Sci. Technol. A10(4), 1462 (1992).
-
(1992)
J. Vac. Sci. Technol.
, vol.A10
, Issue.4
, pp. 1462
-
-
Snyder, P.G.1
Xiong, Y.2
Woollam, J.A.3
Al-Jumaily, G.A.4
Gagliardi, F.J.5
-
9
-
-
0003746634
-
-
Noyes Publications, Park Ridge, NJ
-
J. J. Cuomo, S. M. Rossnagel, and H. R. Kaufman, Eds., Handbook of Ion Beam Processing Technology. Noyes Publications, Park Ridge, NJ (1989).
-
(1989)
Handbook of Ion Beam Processing Technology
-
-
Cuomo, J.J.1
Rossnagel, S.M.2
Kaufman, H.R.3
-
10
-
-
0027885503
-
Inhomogeneous dielectrics grown by plasma-enhanced chemical vapor deposition
-
S. Lim, J. H. Rym, J. F. Wager, and L. M. Cacas, "Inhomogeneous dielectrics grown by plasma-enhanced chemical vapor deposition," Thin Solid Films 236, 64-66 (1993).
-
(1993)
Thin Solid Films
, vol.236
, pp. 64-66
-
-
Lim, S.1
Rym, J.H.2
Wager, J.F.3
Cacas, L.M.4
-
11
-
-
0347523627
-
Properties of multilayer and graded index Si-based coatings deposited in dual-frequency plasma
-
D. Poitras, J. E. Klemberg-Sapieha, A. Moussi, and L. Martinu, "Properties of multilayer and graded index Si-based coatings deposited in dual-frequency plasma," Proc. SPIE 2046, 179-188 (1993).
-
(1993)
Proc. SPIE
, vol.2046
, pp. 179-188
-
-
Poitras, D.1
Klemberg-Sapieha, J.E.2
Moussi, A.3
Martinu, L.4
-
12
-
-
0000894746
-
Dualmode microwave/radio frequency plasma deposition of dielectric thin films
-
L. Martinu, J. E. Klemberg-Sapieha, and M. R. Wertheimer, "Dualmode microwave/radio frequency plasma deposition of dielectric thin films," Appl. Phys. Lett. 54, 2645-2647 (1989).
-
(1989)
Appl. Phys. Lett.
, vol.54
, pp. 2645-2647
-
-
Martinu, L.1
Klemberg-Sapieha, J.E.2
Wertheimer, M.R.3
-
13
-
-
0025665844
-
Dual microwave-R.F. plasma deposition of functional coatings
-
J. E. Klemberg-Sapieha, O. M. Küttel, L. Martinu, and M. R. Wertheimer, "Dual microwave-R.F. plasma deposition of functional coatings," Thin Solid Films 193/194, 965-972 (1990).
-
(1990)
Thin Solid Films
, vol.193-194
, pp. 965-972
-
-
Klemberg-Sapieha, J.E.1
Küttel, O.M.2
Martinu, L.3
Wertheimer, M.R.4
-
14
-
-
0041898242
-
Ion assisted thin film growth in dual microwave/radio frequency plasmas
-
Plasma Properties, Deposition and Etching, J. Pouch S. A. Alterovitz, Trans.-Tech. Publ., Aedermannsdorf, Switzerland
-
L. Martinu and M. R. Wertheimer, "Ion assisted thin film growth in dual microwave/radio frequency plasmas," in Plasma Properties, Deposition and Etching, J. Pouch and S. A. Alterovitz, Eds., Materials Science Forum, Vols. 140 to 142, pp. 405-420, Trans.-Tech. Publ., Aedermannsdorf, Switzerland (1993).
-
(1993)
Materials Science Forum
, vol.140-142
, pp. 405-420
-
-
Martinu, L.1
Wertheimer, M.R.2
-
15
-
-
84967881234
-
Critical ion energy and ion flux in the growth of films by plasma-enhanced chemical-vapor deposition
-
L. Martinu, J. E. Klemberg-Sapieha, O. M. Küttel, A. Raveh, and M. R. Wertheimer, "Critical ion energy and ion flux in the growth of films by plasma-enhanced chemical-vapor deposition," J. Vac. Sci. Technol. A12, 1360-1364 (1994).
-
(1994)
J. Vac. Sci. Technol.
, vol.A12
, pp. 1360-1364
-
-
Martinu, L.1
Klemberg-Sapieha, J.E.2
Küttel, O.M.3
Raveh, A.4
Wertheimer, M.R.5
|