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Volumn 14, Issue 5, 1996, Pages 2775-2779

Plasma deposition of low-stress electret films for electroacoustic and solar cell applications

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0030486339     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580199     Document Type: Article
Times cited : (22)

References (38)
  • 15
    • 0022936657 scopus 로고
    • edited by J. Mort and F. Jansen CRC, Boca Raton
    • A. C. Adams, in Plasma Deposited Thin Films, edited by J. Mort and F. Jansen (CRC, Boca Raton, 1986), p. 129.
    • (1986) Plasma Deposited Thin Films , pp. 129
    • Adams, A.C.1
  • 16
    • 4243098954 scopus 로고
    • edited by S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood, Noyes, Park Ridge, NJ
    • R. Reif, in Handbook of Low Pressure Plasma Processing Technology, edited by S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood, (Noyes, Park Ridge, NJ, 1992), p. 260.
    • (1992) Handbook of Low Pressure Plasma Processing Technology , pp. 260
    • Reif, R.1
  • 17
    • 84940840825 scopus 로고
    • edited by J. L. Vossen and W. Kern Academic, New York
    • R. Reif and W. Kern, in Thin Film Processes II, edited by J. L. Vossen and W. Kern (Academic, New York, 1991), p. 525.
    • (1991) Thin Film Processes II , pp. 525
    • Reif, R.1    Kern, W.2
  • 30
    • 3943091167 scopus 로고
    • edited by J. J. Cuomo, S. M. Rossnagel, and H. R. Kaufman Noyes, Park Ridge, NJ
    • E. Kay and S. Rossnagel, in Handbook of Ion Beam Technology, edited by J. J. Cuomo, S. M. Rossnagel, and H. R. Kaufman (Noyes, Park Ridge, NJ, 1989), p. 170.
    • (1989) Handbook of Ion Beam Technology , pp. 170
    • Kay, E.1    Rossnagel, S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.