Plasma beam deposited amorphous hydrogenated carbon: Improved film quality at higher growth rate

Applied Physics Letters

Volumn 69, Issue 2, 1996, Pages 152-154

  Gielen, J W A M ^a   Van De Sanden, M C M ^a   Schram, D C ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001323515     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116904     Document Type: Article

References (27)

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