Investigation of the role of plasma conditions on the deposition rate and electrochromic performance of tungsten oxide thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 6, 2003, Pages 1927-1933

  Seman, Michael ^a   Wolden, Colin A ^a  

^a Department of Geology and Geological Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CYCLIC VOLTAMMETRY; DISSOCIATION; ELECTROCHROMISM; FLUORINE; FREE RADICALS; HYDROGEN; ION BOMBARDMENT; LIGHT TRANSMISSION; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; TUNGSTEN COMPOUNDS;

ACTINOMETRY; ATOMIC FLUORINE DENSITY; ATOMIC OXYGEN DENSITY; ELECTRON ENERGY DISTRIBUTION; HYDROGEN INTERCALATION; OPTICAL EMISSION SPECTROSCOPY; TUNGSTEN HEXAFLUORIDE; TUNGSTEN OXIDE;

THIN FILMS;

EID: 0842268519     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1619416     Document Type: Article

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