SCOPUS 정보 검색 플랫폼

Journal of Nanoscience and Nanotechnology

Volumn 13, Issue 5, 2013, Pages 3145-3172

UV-nanoimprint lithography: Structure, materials and fabrication of flexible molds

(2) Lan, Hongbo a Liu, Hongzhong b

a QINGDAO TECHNOLOGICAL UNIVERSITY (China)

b XI'AN JIAOTONG UNIVERSITY (China)

Author keywords

Composite mold; Flexible molds; Large area patterning; Soft UV nanoimprint lithography

Indexed keywords

APPLICATION REQUIREMENTS; COMPOSITE MOLD; COMPOUND SEMICONDUCTORS; DEFORMATION MECHANISM; FLEXIBLE MOLDS; LARGE-AREA PATTERNING; PATTERNING TECHNOLOGY; UV NANOIMPRINT LITHOGRAPHY;

FABRICATION; LIGHT EMITTING DIODES; MACHINE TOOLS; MOLDS; NANOPHOTONICS; PRODUCTION ENGINEERING; SEMICONDUCTOR DEVICES; SILICON WAFERS; THROUGHPUT;

NANOIMPRINT LITHOGRAPHY;

NANOPARTICLE;

CHEMISTRY; EQUIPMENT; METHODOLOGY; MOLECULAR IMPRINTING; PHOTOGRAPHY; RADIATION EXPOSURE; REVIEW; SURFACE PROPERTY; ULTRASTRUCTURE; ULTRAVIOLET RADIATION; YOUNG MODULUS;

ELASTIC MODULUS; MOLECULAR IMPRINTING; NANOPARTICLES; PHOTOGRAPHY; SURFACE PROPERTIES; ULTRAVIOLET RAYS;

MLCS; MLOWN;

EID: 84876910938 PISSN: 15334880 EISSN: 15334899 Source Type: Journal
DOI: 10.1166/jnn.2013.7437 Document Type: Review

Times cited : (74)

References (105)

1
- 82455167175
- M. A. Verschuuren, P. Gerlach, H. A. van Sprang, and A. Polman, Nanotechnology 22, 505201 (2011).
- (2011) Nanotechnology , vol.22 , pp. 505201
- Verschuuren, M.A.¹ Gerlach, P.² Van Sprang, H.A.³ Polman, A.⁴

2
- 84876900154
- edited by B. Cui, InTech, New York
- Y. C. Lee and S. H. Tu, Recent Advances in Nanofabrication Techniques and Applications, edited by B. Cui, InTech, New York (2011), p. 173.
- (2011) Recent Advances in Nanofabrication Techniques and Applications , pp. 173
- Lee, Y.C.¹ Tu, S.H.²

3
- 79955753409
- J. H. Baek, S. M. Kim, I. H. Lee, and N. Hwang, Proc. SPIE 7945, 79451B (2011).
- (2011) Proc. SPIE , vol.7945
- Baek, J.H.¹ Kim, S.M.² Lee, I.H.³ Hwang, N.⁴

4
- 84860358402
- Y. Yang, K. Mielczarek, M. Aryal, A. Zakhidov, and W. Hu, ACS Nano 6, 2877 (2012).
- (2012) ACS Nano , vol.6 , pp. 2877
- Yang, Y.¹ Mielczarek, K.² Aryal, M.³ Zakhidov, A.⁴ Hu, W.⁵

5
- 80053355739
- B. Farshchian, A. Amirsadeghi, S. M. Hurst, J. Wu, J. Lee, and S. Park, Microelectron Eng. 88, 3287 (2011).
- (2011) Microelectron Eng. , vol.88 , pp. 3287
- Farshchian, B.¹ Amirsadeghi, A.² Hurst, S.M.³ Wu, J.⁴ Lee, J.⁵ Park, S.⁶

6
- 0030570065
- Y. Chou, P. Krauss, and P. Renstrom, Science 272, 85 (1996).
- (1996) Science , vol.272 , pp. 85
- Chou, Y.¹ Krauss, P.² Renstrom, P.³

7
- 41549124541
- H. Schift, J. Vac. Sci. Technol. B 26, 458 (2008).
- (2008) J. Vac. Sci. Technol. B , vol.26 , pp. 458
- Schift, H.¹

8
- 84896219446
- Nanoimprint lithography: Principles processes and materials
- Pub. Inc., New York
- H. Lan, Y. Ding, and H. Liu, Nanoimprint Lithography: Principles, Processes and Materials, Nova Science Pub. Inc., New York (2011).
- (2011) Nova Science
- Lan, H.¹ Ding, Y.² Liu, H.³

9
- 2942558559
- J. Guo, J. Phys D: Appl. Phys. 37, R123 (2004).
- (2004) J. Phys D: Appl. Phys. , vol.37
- Guo, J.¹

10
- 34250642011
- J. Guo, Adv. Mater. 19, 495 (2007).
- (2007) Adv. Mater. , vol.19 , pp. 495
- Guo, J.¹

11
- 33646024012
- M. Bender, A. Fuchs, U. Plachetka, and H. Kurz, Microelectron Eng. 83, 827 (2006).
- (2006) Microelectron Eng. , vol.83 , pp. 827
- Bender, M.¹ Fuchs, A.² Plachetka, U.³ Kurz, H.⁴

12
- 84891617023
- edited by K. Y. Kim, InTech, New York
- J. Viheriälä, T. Niemi, and J. Kontio, Recent Optical and Photonic Technologies, edited by K. Y. Kim, InTech, New York (2010).
- (2010) Recent Optical and Photonic Technologies
- Viheriälä, J.¹ Niemi, T.² Kontio, J.³

13
- 84870162630
- edited by B. Cui, InTech, New York
- A. Cattoni, J. Chen, and D. Decanini, Recent Advances in Nanofabrication Techniques and Applications, edited by B. Cui, InTech, New York (2011).
- (2011) Recent Advances in Nanofabrication Techniques and Applications
- Cattoni, A.¹ Chen, J.² Decanini, D.³

14
- 76949084620
- R. Ji, M. Hornung, M. A. Verschuuren, R. van de Laar, J. van Eekelen, U. Plachetka, M. Moeller, and C. Moormann, Microelectron. Eng. 87, 963 (2010).
- (2010) Microelectron. Eng. , vol.87 , pp. 963
- Ji, R.¹ Hornung, M.² Verschuuren, M.A.³ Van De, L.R.⁴ Van Eekelen, J.⁵ Plachetka, U.⁶ Moeller, M.⁷ Moormann, C.⁸

15
- 14944343758
- U. Plachetka, M. Bender, A. Fuchs, B. Vratzov, T. Glinsner, F. Lindner, and H. Kurz, Microelectron. Eng. 73-74, 167 (2004).
- (2004) Microelectron. Eng. , vol.73-74 , pp. 167
- Plachetka, U.¹ Bender, M.² Fuchs, A.³ Vratzov, B.⁴ Glinsner, T.⁵ Lindner, F.⁶ Kurz, H.⁷

16
- 67349208771
- H. Hiroshima, Microelectron. Eng. 86, 611 (2009).
- (2009) Microelectron. Eng. , vol.86 , pp. 611
- Hiroshima, H.¹

17
- 0013231540
- edited by M. Wang, InTech, New York
- H. Lan and Y. Ding, Lithography, edited by M. Wang, InTech, New York (2010).
- (2010) Lithography
- Lan, H.¹ Ding, Y.²

18
- 84859967181
- Ph.D. Dissertation, Utrecht University, Utrecht
- M. A. Verschuuren, Substrate Conformal Imprint Lithography for Nanophotonics, Ph.D. Dissertation, Utrecht University, Utrecht (2011).
- (2011) Substrate Conformal Imprint Lithography for Nanophotonics
- Verschuuren, M.A.¹

19
- 79951847918
- Gyeonggi-Do
- M. Hornung, R. Ji, and M. Verschuuren, 2010 10th IEEE Conference on Nanotechnol., Gyeonggi-Do (2010), p. 339.
- (2010) 2010 10th IEEE Conference on Nanotechnol , pp. 339
- Hornung, M.¹ Ji, R.² Verschuuren, M.³

20
- 84865608731
- H. Schmitt, P. Duempelmann, R. Fader, M. Rommel, A. J. Bauer, L. Frey, M. Brehm, and A. Kraft, Microelectron Eng. 98, 275 (2012).
- (2012) Microelectron Eng. , vol.98 , pp. 275
- Schmitt, H.¹ Duempelmann, P.² Fader, R.³ Rommel, M.⁴ Bauer, A.J.⁵ Frey, L.⁶ Brehm, M.⁷ Kraft, A.⁸

21
- 84876920127
- SUSS, http://www.suss.com/index.php (2012).
- (2012) SUSS

22
- 84876904824
- Dalian
- H. Lan, BIT's 1st Annual world congress of Nano-S&T-2011, Dalian (2011).
- (2011) BIT's 1st Annual World Congress of Nano-S&T-2011
- Lan, H.¹

23
- 72849119623
- H. Hiroshima, J. Vac. Sci. Technol. B 27, 2862 (2009).
- (2009) J. Vac. Sci. Technol. B , vol.27 , pp. 2862
- Hiroshima, H.¹

24
- 84876929344
- John Wiley & Sons, Inc., New Jersey
- J. A. Rogers and H. H. Lee, John Wiley & Sons, Inc., New Jersey (2008).
- (2008)
- Rogers, J.A.¹ Lee, H.H.²

25
- 33748257848
- U. Plachetka, M. Bender, A. Fuchs, T. Wahlbrink, T. Glinsner, and H. Kurz, Microelectron Eng. 83, 944 (2006).
- (2006) Microelectron Eng. , vol.83 , pp. 944
- Plachetka, U.¹ Bender, M.² Fuchs, A.³ Wahlbrink, T.⁴ Glinsner, T.⁵ Kurz, H.⁶

26
- 13244254140
- M. Bender, U. Plachetka, J. Ran, A. Fuchs, B. Vratzov, H. Kurz, T. Glinsner, and F. Lindner, J. Vac. Sci. Technol. B 22, 3229 (2004).
- (2004) J. Vac. Sci. Technol. B , vol.22 , pp. 3229
- Bender, M.¹ Plachetka, U.² Ran, J.³ Fuchs, A.⁴ Vratzov, B.⁵ Kurz, H.⁶ Glinsner, T.⁷ Lindner, F.⁸

27
- 76949098029
- D. Decanini, G. Faini, J and A.-M. Haghiri-Gosnet, Microelectron. Eng. 87, 1015 (2010).
- (2010) Microelectron. Eng. , vol.87 , pp. 1015
- Decanini, D.¹ Faini, G.J.² Haghiri-Gosnet, A.-M.³

28
- 84874499358
- G. Barbillon, Micromachines 3, 21 (2012).
- (2012) Micromachines , vol.3 , pp. 21
- Barbillon, G.¹

29
- 84876925266
- Berlin
- M. Verschuuren, R. van Brakel, R. van de Laar, R. Ji, and M. Hornung, International Conference on Micro and Nano Engineering, Berlin (2011).
- (2011) International Conference on Micro and Nano Engineering
- Verschuuren, M.¹ Van Brakel, R.² Van De Laar, R.³ Ji, R.⁴ Hornung, M.⁵

30
- 14944339226
- E. Roy, Y. Kanamori, M. Belotti, and Y. Chen, Microelectron. Eng. 78-79, 689 (2005).
- (2005) Microelectron. Eng. , vol.78-79 , pp. 689
- Roy, E.¹ Kanamori, Y.² Belotti, M.³ Chen, Y.⁴

31
- 77951032579
- S. S. Williams, S. Retterer, R. Lopez, R. Ruiz, E. T. Samulski, and J. M. DeSimone, Nano Lett. 10, 1421 (2010).
- (2010) Nano Lett. , vol.10 , pp. 1421
- Williams, S.S.¹ Retterer, S.² Lopez, R.³ Ruiz, R.⁴ Samulski, E.T.⁵ Desimone, J.M.⁶

32
- 67349147030
- S. Gilles, M. Meier, M. Prömpers, A. van der Hart, C. Kügeler, Andreas Offenhäusser, and D. Mayer, Microelectron. Eng. 86, 661(2009).
- (2009) Microelectron. Eng , vol.86 , pp. 661
- Gilles, S.¹ Meier, M.² Prömpers, M.³ Hart Van-Der, A.⁴ Kügeler, C.⁵ Offenhäusser, A.⁶ Mayer, D.⁷

33
- 27144465249
- D. G. Choi, J. H. Jeong, Y. Sim, E. Lee, W. Kim, and B. Bae, Langmuir 21, 9390 (2005).
- (2005) Langmuir , vol.21 , pp. 9390
- Choi, D.G.¹ Jeong, J.H.² Sim, Y.³ Lee, E.⁴ Kim, W.⁵ Bae, B.⁶

34
- 17344395116
- W. M. Choi and O. O. Park, Microelectron. Eng. 73-74, 178 (2004).
- (2004) Microelectron. Eng. , vol.73-74 , pp. 178
- Choi, W.M.¹ Park, O.O.²

35
- 43249092818
- N. Koo, U. Plachetka, M. Otto, J. Bolten, J. H. Jeong, E. S. Lee, and H. Kurz, Nanotechnology 19, 225304 (2008).
- (2008) Nanotechnology , vol.19 , pp. 225304
- Koo, N.¹ Plachetka, U.² Otto, M.³ Bolten, J.⁴ Jeong, J.H.⁵ Lee, E.S.⁶ Kurz, H.⁷

36
- 0033742531
- H. Schmid and B. Michel, Macromolecules 33, 3042 (2000).
- (2000) Macromolecules , vol.33 , pp. 3042
- Schmid, H.¹ Michel, B.²

37
- 10844291014
- F. Hua, Y. Sun, A. Gaur, M. A. Meitl, L. Bilhaut, L. Rotkina, J. Wang, P. Geil, M. Shim, and J. A. Rogers, Nano Lett. 4, 2467 (2004).
- (2004) Nano Lett. , vol.4 , pp. 2467
- Hua, F.¹ Sun, Y.² Gaur, A.³ Meitl, M.A.⁴ Bilhaut, L.⁵ Rotkina, L.⁶ Wang, J.⁷ Geil, P.⁸ Shim, M.⁹ Rogers, J.A.¹⁰

38
- 79952369009
- L. Pei, A. Balls, C. Tippets, J. Abbott, M. R. Linford, J. Hu, A. Madan, D. D. Allred, R. R. Vanfleet, and R. C. Davis, J. Vac. Sci. Technol. A 29, 021017 (2011).
- (2011) J. Vac. Sci. Technol. A , vol.29 , pp. 021017
- Pei, L.¹ Balls, A.² Tippets, C.³ Abbott, J.⁴ Linford, M.R.⁵ Hu, J.⁶ Madan, A.⁷ Allred, D.D.⁸ Vanfleet, R.R.⁹ Davis, R.C.¹⁰

39
- 66749163167
- Z. Li, Y. Gu, and L. Wang, Nano Lett. 9, 2306 (2009).
- (2009) Nano Lett. , vol.9 , pp. 2306
- Li, Z.¹ Gu, Y.² Wang, L.³

40
- 0037173312
- T. W. Odom, J. C. Love, D. B. Wolfe, K. E. Paul, and G. M. Whitesides, Langmuir 18, 5314 (2002).
- (2002) Langmuir , vol.18 , pp. 5314
- Odom, T.W.¹ Love, J.C.² Wolfe, D.B.³ Paul, K.E.⁴ Whitesides, G.M.⁵

41
- 0037427253
- K. M Choi and J. A. Rogers, J. Am. Chem. Soc. 125, 4060 (2003).
- (2003) J. Am. Chem. Soc. , vol.125 , pp. 4060
- Choi, K.M.¹ Rogers, J.A.²

42
- 34247595491
- N. Koo, M. Bender, U. Plachetka, A. Fuchs, T. Wahlbrink, J. Bolten, and H. Kurz, Microelectron. Eng. 84, 904 (2007).
- (2007) Microelectron. Eng. , vol.84 , pp. 904
- Koo, N.¹ Bender, M.² Plachetka, U.³ Fuchs, A.⁴ Wahlbrink, T.⁵ Bolten, J.⁶ Kurz, H.⁷

43
- 84876919186
- edited by W. S. Dennis Jr., S. T. Iacono, D. J. Boday, and S. C. Kettwich, ACS Publications
- D. J. Boday, in Advances in Fluorine-Containing Polymers, edited by W. S. Dennis Jr., S. T. Iacono, D. J. Boday, and S. C. Kettwich, ACS Publications (2012).
- (2012) Advances in Fluorine-Containing Polymers
- Boday, D.J.¹

44
- 84865610133
- C. Con, J. Zhang, Z. Jahed, T. Y. Tsui, M. Yavuz, and B. Cui, Microelectron Eng. 98, 246 (2012).
- (2012) Microelectron Eng. , vol.98 , pp. 246
- Con, C.¹ Zhang, J.² Jahed, Z.³ Tsui, T.Y.⁴ Yavuz, M.⁵ Cui, B.⁶

45
- 58149252825
- J. Perumal, D. P. Kim, and J. J. Lee, J. Nanosci. Nanotechnol. 8, 5341 (2008).
- (2008) J. Nanosci. Nanotechnol. , vol.8 , pp. 5341
- Perumal, J.¹ Kim, D.P.² Lee, J.J.³

46
- 77957318257
- S. Gilles, M. Diez, A. Offenhäusser, M. C. Lensen, and D. Mayer, Nanotechnology 21 245307 (2010).
- (2010) Nanotechnology , vol.21 , pp. 245307
- Gilles, S.¹ Diez, M.² Offenhäusser, A.³ Lensen, M.C.⁴ Mayer, D.⁵

47
- 67349242452
- M. Mühlberger, I. Bergmair, A. Klukowska, A. Kolander, H. Leichtfried, E. Platzgummer, H. Loeschner, Ch. Ebm, G. Grützner, and R. Schöftner, Microelectron Eng. 86, 691 (2009).
- (2009) Microelectron Eng. , vol.86 , pp. 691
- Mühlberger, M.¹ Bergmair, I.² Klukowska, A.³ Kolander, A.⁴ Leichtfried, H.⁵ Platzgummer, E.⁶ Loeschner, H.⁷ Ebm, Ch.⁸ Grützner, G.⁹ Schöftner, R.¹⁰

48
- 84861314594
- J. K. Kim, H. S. Cho, H. S. Jung, K. Lim, K. B. Kim, D. G. Choi, J. H. Jeong, and K. Y. Suh, Nanotechnology 23, 235303 (2012).
- (2012) Nanotechnology , vol.23 , pp. 235303
- Kim, J.K.¹ Cho, H.S.² Jung, H.S.³ Lim, K.⁴ Kim, K.B.⁵ Choi, D.G.⁶ Jeong, J.H.⁷ Suh, K.Y.⁸

49
- 67049156244
- J. Perumal, T. H. Yoon, H. S. Jang, J. J. Lee, and D. P. Kim, Nanotechnology 20, 055704 (2009).
- (2009) Nanotechnology , vol.20 , pp. 055704
- Perumal, J.¹ Yoon, T.H.² Jang, H.S.³ Lee, J.J.⁴ Kim, D.P.⁵

50
- 79953772519
- Z. Zhu, Q. Li, L. Zhang, M. Chen, and S. Fan, J. Vac. Sci. Technol. B 29, 021015 (2011).
- (2011) J. Vac. Sci. Technol. B , vol.29 , pp. 021015
- Zhu, Z.¹ Li, Q.² Zhang, L.³ Chen, M.⁴ Fan, S.⁵

51
- 33847731541
- T. T. Truong, R. Lin, S. Jeon, H. H. Lee, J. Maria, A. Gaur, F. Hua, I. Meinel, and J. A. Rogers, Langmuir 23, 2898 (2007).
- (2007) Langmuir , vol.23 , pp. 2898
- Truong, T.T.¹ Lin, R.² Jeon, S.³ Lee, H.H.⁴ Maria, J.⁵ Gaur, A.⁶ Hua, F.⁷ Meinel, I.⁸ Rogers, J.A.⁹

52
- 8844279077
- J. P. Rolland, E. C. Hagberg, G. M. Denison, K. R. Carter, and J. M. De Simone, Angew. Chem. Int. Ed. 43, 5796 (2004).
- (2004) Angew. Chem. Int. Ed. , vol.43 , pp. 5796
- Rolland, J.P.¹ Hagberg, E.C.² Denison, G.M.³ Carter, K.R.⁴ De Simone, J.M.⁵

53
- 34948876834
- D. R. Barbero, M. S. M. Saifullah, P. Hoffmann, H. J. Mathieu, D. Anderson, G. A. C. Jones, M. E. Welland, and U. Steiner, Adv. Funct. Mater. 17, 2419 (2007).
- (2007) Adv. Funct. Mater. , vol.17 , pp. 2419
- Barbero, D.R.¹ Saifullah, M.S.M.² Hoffmann, P.³ Mathieu, H.J.⁴ Anderson, D.⁵ Jones, G.A.C.⁶ Welland, M.E.⁷ Steiner, U.⁸

54
- 84876932030
- Fluon ETFE, http://www.fluon.jp/fluon/english/products/etfe/index.shtml (2012).
- (2012) Fluon ETFE

55
- 84876934497
- resin
- Tefzel® ETFE resin, http://www2.dupont.com/Teflon-Industrial/en -US/products/product-by-name/tefzel-etfe/index.html (2012).
- (2012) Tefzel® ETFE

56
- 34547596246
- M. J. Kim, J. E. Park, S. Song, and H. H. Lee, J. Vac. Sci. Technol. B 25, 1412 (2007).
- (2007) J. Vac. Sci. Technol. B , vol.25 , pp. 1412
- Kim, M.J.¹ Park, J.E.² Song, S.³ Lee, H.H.⁴

57
- 1842477459
- D. Y. Khang and H. H. Lee, Langmuir 20, 2445 (2004).
- (2004) Langmuir , vol.20 , pp. 2445
- Khang, D.Y.¹ Lee, H.H.²

58
- 2342484965
- D. Y. Khang, H. Kang, T. Kim, and H. H. Lee, Nano Lett. 4, 633 (2004).
- (2004) Nano Lett. , vol.4 , pp. 633
- Khang, D.Y.¹ Kang, H.² Kim, T.³ Lee, H.H.⁴

59
- 84862956099
- H. Lin, X. Wan, X. Jiang, Q. Wang, and J. Yin, J. Mater. Chem. 22, 2616 (2012).
- (2012) J. Mater. Chem. , vol.22 , pp. 2616
- Lin, H.¹ Wan, X.² Jiang, X.³ Wang, Q.⁴ Yin, J.⁵

60
- 12744262872
- W. S. Kim, K. S. Kim, Y. C. Eo, K. B. Yoon, and B. S. Bae, J. Mater. Chem. 15, 465 (2005).
- (2005) J. Mater. Chem. , vol.15 , pp. 465
- Kim, W.S.¹ Kim, K.S.² Eo, Y.C.³ Yoon, K.B.⁴ Bae, B.S.⁵

61
- 34247589260
- Y. Kawaguchi, F. Nonaka, and Y. Sanada, Microelectron Eng. 84, 973 (2007).
- (2007) Microelectron Eng. , vol.84 , pp. 973
- Kawaguchi, Y.¹ Nonaka, F.² Sanada, Y.³

62
- 69549095856
- T. Haatainen, T. Mäkelä, J. Ahopelto, and Y. Kawaguchi, Microelectron Eng. 86, 2293 (2009).
- (2009) Microelectron Eng. , vol.86 , pp. 2293
- Haatainen, T.¹ Mäkelä, T.² Ahopelto, J.³ Kawaguchi, Y.⁴

63
- 84855461440
- J. Y. Kim, K. S. Park, Z. S. Kim, K. H. Baek, and L. M. Do, Soft Matter. 8, 1184 (2012).
- (2012) Soft Matter. , vol.8 , pp. 1184
- Kim, J.Y.¹ Park, K.S.² Kim, Z.S.³ Baek, K.H.⁴ Do, L.M.⁵

64
- 20644436244
- D. Suh, S. J. Choi, and H. H. Lee, Adv. Mater. 17, 1554 (2005).
- (2005) Adv. Mater. , vol.17 , pp. 1554
- Suh, D.¹ Choi, S.J.² Lee, H.H.³

65
- 9244242087
- P. J. Yoo, S. J. Choi, J. H. Kim, D. Suh, S. J. Baek, T. W. Kim, and H. H. Lee, Chem. Mater. 16, 5000 (2004).
- (2004) Chem. Mater. , vol.16 , pp. 5000
- Yoo, P.J.¹ Choi, S.J.² Kim, J.H.³ Suh, D.⁴ Baek, S.J.⁵ Kim, T.W.⁶ Lee, H.H.⁷

66
- 67349232285
- A. Klukowska, A. Kolander, I. Bergmair, M. Mühlberger, H. Leichtfried, F. Reuther, G. Grützner, and R. Schöftner, Microelectron Eng. 86, 697 (2009).
- (2009) Microelectron Eng. , vol.86 , pp. 697
- Klukowska, A.¹ Kolander, A.² Bergmair, I.³ Mühlberger, M.⁴ Leichtfried, H.⁵ Reuther, F.⁶ Grützner, G.⁷ Schöftner, R.⁸

67
- 67349242452
- M. Mühlberger, I. Bergmair, A. Klukowska, A. Kolander, H. Leichtfried, E. Platzgummer, H. Loeschner, Ch. Ebm, G. Grützner, and R. Schöftner, Microelectron. Eng. 86, 691 (2009).
- (2009) Microelectron. Eng. , vol.86 , pp. 691
- Mühlberger, M.¹ Bergmair, I.² Klukowska, A.³ Kolander, A.⁴ Leichtfried, H.⁵ Platzgummer, E.⁶ Loeschner, H.⁷ Ebm, Ch.⁸ Grützner, G.⁹ Schöftner, R.¹⁰

68
- 84876905741
- Ormostamp, http://www.microresist.de/projects/transparent-nanostamp -evaluation-en.htm (2012).
- (2012) Ormostamp

69
- 33746626110
- W. Kim, D. Choi, and B. Bae, Nanotechnology 17, 3319 (2006).
- (2006) Nanotechnology , vol.17 , pp. 3319
- Kim, W.¹ Choi, D.² Bae, B.³

70
- 3042694518
- S. J. Choi, P. J. Yoo, S. J. Baek, T. W. Kim, and H. H. Lee, J. Am. Chem. Soc. 126, 7744 (2004).
- (2004) J. Am. Chem. Soc. , vol.126 , pp. 7744
- Choi, S.J.¹ Yoo, P.J.² Baek, S.J.³ Kim, T.W.⁴ Lee, H.H.⁵

71
- 59049099165
- S. H. Hong, J. Y. Hwang, H. Lee, H. C. Lee, and K. W. Choi, Microelectron. Eng. 86, 295 (2009).
- (2009) Microelectron. Eng. , vol.86 , pp. 295
- Hong, S.H.¹ Hwang, J.Y.² Lee, H.³ Lee, H.C.⁴ Choi, K.W.⁵

72
- 77955742596
- S. H. Hong, B. J. Bae, K. S. Han, E. J. Hong, H. Lee, and K. W. Choi, Electronic Materials Lett. 5, 39 (2012).
- (2012) Electronic Materials Lett. , vol.5 , pp. 39
- Hong, S.H.¹ Bae, B.J.² Han, K.S.³ Hong, E.J.⁴ Lee, H.⁵ Choi, K.W.⁶

73
- 84876927820
- Hewlett-Packard Development Company
- A. M. Almanza-Workman, T. P. Carl, A. H. Jeans, and H. C. Albert, Technical Reports, Hewlett-Packard Development Company (2011).
- (2011) Technical Reports
- Almanza-Workman, A.M.¹ Carl, T.P.² Jeans, A.H.³ Albert, H.C.⁴

74
- 84876934431
- J. He, S. Howitz, S. Killge, K. Richter, and J. W. Bartha, Proc. SPIE 8323, 83231B (2012).
- (2012) Proc. SPIE , vol.8323
- He, J.¹ Howitz, S.² Killge, S.³ Richter, K.⁴ Bartha, J.W.⁵

75
- 13244283408
- F. Lazzarino, C. Gourgon, P. Schiavone, and C. Perret, J. Vac. Sci. Technol. B 22, 3318 (2004).
- (2004) J. Vac. Sci. Technol. B , vol.22 , pp. 3318
- Lazzarino, F.¹ Gourgon, C.² Schiavone, P.³ Perret, C.⁴

76
- 67149130602
- J. Viheriälä, M. Viljanen, J. Kontio, T. Leinonen, J. Tommila, M. Dumitrescu, T. Niemi, and M. Pessa, Proc. SPIE 7271, 72711O (2009).
- (2009) Proc. SPIE , vol.7271
- Viheriälä, J.¹ Viljanen, M.² Kontio, J.³ Leinonen, T.⁴ Tommila, J.⁵ Dumitrescu, M.⁶ Niemi, T.⁷ Pessa, M.⁸

77
- 34247617296
- M. Miller, G. Schmid, G. Doyle, E. Thompson, and D. J. Resnick, Microelectron Eng. 84, 885 (2007).
- (2007) Microelectron Eng. , vol.84 , pp. 885
- Miller, M.¹ Schmid, G.² Doyle, G.³ Thompson, E.⁴ Resnick, D.J.⁵

78
- 79952449457
- N. Koo, M. Otto, J. W. Kim, J. H. Jeong, and H. Kurz, Microelectron. Eng. 88, 1033 (2011).
- (2011) Microelectron. Eng. , vol.88 , pp. 1033
- Koo, N.¹ Otto, M.² Kim, J.W.³ Jeong, J.H.⁴ Kurz, H.⁵

79
- 59849089611
- H. Lan, Y. Ding, H. Liu, Y. Que, W. Tao, H. Li, and B. Lu, Sci. China Series E: Technol. Sci. 52, 294 (2009).
- (2009) Sci. China Series E: Technol. Sci. , vol.52 , pp. 294
- Lan, H.¹ Ding, Y.² Liu, H.³ Que, Y.⁴ Tao, W.⁵ Li, H.⁶ Lu, B.⁷

80
- 49549105994
- S. Merino, A. Retolaza, A. Juarros, and H. Schift, Microelectron. Eng. 85, 1892 (2008).
- (2008) Microelectron. Eng. , vol.85 , pp. 1892
- Merino, S.¹ Retolaza, A.² Juarros, A.³ Schift, H.⁴

81
- 34748815130
- H. B. Lan, Y. C Ding. H. Z. Liu, and B. H. Lu, J. Micromech. Microeng. 17, 2039 (2007).
- (2007) J. Micromech. Microeng. , vol.17 , pp. 2039
- Lan, H.B.¹ Ding, Y.C.² Liu, H.Z.³ Lu, B.H.⁴

82
- 70350316214
- H. Hocheng and W. H. Hsu, J. Nanosci. Nanotechnol. 9, 4267 (2008).
- (2008) J. Nanosci. Nanotechnol. , vol.9 , pp. 4267
- Hocheng, H.¹ Hsu, W.H.²

83
- 70349761409
- Y. Cho, S. Kwon, J. Seo, J. Kim, J. Cho, J. Park, H. Kim, and S. Lee, Microelectron Eng. 86, 2417 (2009).
- (2009) Microelectron Eng. , vol.86 , pp. 2417
- Cho, Y.¹ Kwon, S.² Seo, J.³ Kim, J.⁴ Cho, J.⁵ Park, J.⁶ Kim, H.⁷ Lee, S.⁸

84
- 84859613820
- M. R. Saleem, P. A. Stenberg, M. B. Khan, Z. M. Khan, S. Honkanen, and J. Turunen, Proc. SPIE 8249, 82490G (2012).
- (2012) Proc. SPIE , vol.8249
- Saleem, M.R.¹ Stenberg, P.A.² Khan, M.B.³ Khan, Z.M.⁴ Honkanen, S.⁵ Turunen, J.⁶

85
- 56349134081
- M. P. C. Watts, Proc. SPIE 7039, 70390A (2008).
- (2008) Proc. SPIE , vol.7039
- Watts, M.P.C.¹

86
- 77953317906
- Y. Zhou, M. Asbahi, and G. Luo, Proc. SPIE 7637, 76371X (2010).
- (2010) Proc. SPIE , vol.7637
- Zhou, Y.¹ Asbahi, M.² Luo, G.³

87
- 20344378242
- R. Pelzer, C. Gourgon, S. Landis, and P. Kettner, Proc. SPIE 5650, 256 (2005).
- (2005) Proc. SPIE , vol.5650 , pp. 256
- Pelzer, R.¹ Gourgon, C.² Landis, S.³ Kettner, P.⁴

88
- 67149122436
- R. Miller, T. Glinsner, G. Kreindl, P. Lindner, and M. Wimplinger, Proc. SPIE 7271, 72712J (2009).
- (2009) Proc. SPIE , vol.7271
- Miller, R.¹ Glinsner, T.² Kreindl, G.³ Lindner, P.⁴ Wimplinger, M.⁵

89
- 2542503794
- C. D. Schaper, J. Microlith., Microfab., Microsyst. 3, 174 (2004).
- (2004) J. Microlith., Microfab., Microsyst. , vol.3 , pp. 174
- Schaper, C.D.¹

90
- 84876902399
- (print version), edited by J. A. Schwarz and C. I. Contescu, CRC Press, New York
- D. B. Wolfe, J. C. Love, and G. Whitesides, Dekker encyclopedia of nanoscience and nanotechnology-Six volume set (print version), edited by J. A. Schwarz and C. I. Contescu, CRC Press, New York (2004), p. 2467.
- (2004) Dekker Encyclopedia of Nanoscience and Nanotechnology-Six Volume Set , pp. 2467
- Wolfe, D.B.¹ Love, J.C.² Whitesides, G.³

91
- 84859579682
- B. Kobrin, E. S. Barnard, M. L. Brongersma, M. K. Kwak, and L. J. Guo, Proc. SPIE 8249, 82490O (2012).
- (2012) Proc. SPIE , vol.8249
- Kobrin, B.¹ Barnard, E.S.² Brongersma, M.L.³ Kwak, M.K.⁴ Guo, L.J.⁵

92
- 56249122935
- S. S. Williams, M. J. Hampton, V. Gowrishankar, I. Ding, L. Zhang, D. Ko, J. L. Templeton, J. M. DeSimone, M. D. McGehee, and E. T. Samulski, Proc. SPIE 7047, 70470I ( 2008).
- (2008) Proc. SPIE , vol.7047
- Williams, S.S.¹ Hampton, M.J.² Gowrishankar, V.³ Ding, I.⁴ Zhang, L.⁵ Ko, D.⁶ Templeton, J.L.⁷ Desimone, J.M.⁸ McGehee, M.D.⁹ Samulski, E.T.¹⁰

93
- 49249116938
- I. W. Moran, A. L. Briseno, S. Loser, and K. R. Carter, Chem. Mater. 20, 4595 (2008).
- (2008) Chem. Mater. , vol.20 , pp. 4595
- Moran, I.W.¹ Briseno, A.L.² Loser, S.³ Carter, K.R.⁴

94
- 67349254148
- J. Shi, J. Chen, D. Decanini, Y. Chen, and A.-M. Haghiri-Gosnet, Microelectron. Eng. 86, 596 (2009).
- (2009) Microelectron. Eng. , vol.86 , pp. 596
- Shi, J.¹ Chen, J.² Decanini, D.³ Chen, Y.⁴ Haghiri-Gosnet, A.-M.⁵

95
- 84865115876
- G. Kim, M. Jeong, H. Lim, J. Lee, K. B. Choi, and L. M. Do, J. Nanosci. Nanotechnol. 12, 5336 (2012).
- (2012) J. Nanosci. Nanotechnol. , vol.12 , pp. 5336
- Kim, G.¹ Jeong, M.² Lim, H.³ Lee, J.⁴ Choi, K.B.⁵ Do, L.M.⁶

96
- 84863326895
- K. I. Kim, K. S. Han, K. Y. Yang, H. S. Kim, and H. Lee, J. Nanosci. Nanotechnol. 12, 3417 (2012).
- (2012) J. Nanosci. Nanotechnol. , vol.12 , pp. 3417
- Kim, K.I.¹ Han, K.S.² Yang, K.Y.³ Kim, H.S.⁴ Lee, H.⁵

97
- 84865109432
- H. J. Lim, J. J. Lee, S. Park, K. B. Choi, G. H. Kim, H. H. Park, and J. H. Ryu, J. Nanosci. Nanotechnol. 12, 5489 (2012).
- (2012) J. Nanosci. Nanotechnol. , vol.12 , pp. 5489
- Lim, H.J.¹ Lee, J.J.² Park, S.³ Choi, K.B.⁴ Kim, G.H.⁵ Park, H.H.⁶ Ryu, J.H.⁷

98
- 84863078714
- S. Ahn, J. Choi, E. Kim, K. Y. Dong, H. Jeon, B. K. Ju, and K. B. Lee, J. Nanosci. Nanotechnol. 11, 6039 (2011).
- (2011) J. Nanosci. Nanotechnol. , vol.11 , pp. 6039
- Ahn, S.¹ Choi, J.² Kim, E.³ Dong, K.Y.⁴ Jeon, H.⁵ Ju, B.K.⁶ Lee, K.B.⁷

99
- 84865761377
- A. K. G. Tavakkoli, M. Ranjbar, and S. N. Piramanayagam, S. K. Wong, W. C. Poh, R. Sbiaa, and T. C. Chong, Nanosci. Nanotechnol. Lett. 4, 835 (2012).
- (2012) Nanosci. Nanotechnol. Lett. , vol.4 , pp. 835
- Tavakkoli, A.K.G.¹ Ranjbar, M.² Piramanayagam, S.N.³ Wong, S.K.⁴ Poh, W.C.⁵ Sbiaa, R.⁶ Chong, T.C.⁷

100
- 84865146629
- S. M. Ng, H. F. Wong, H. K. Lau, and C. W. Leung, J. Nanosci. Nanotechnol. 12, 6315 (2012).
- (2012) J. Nanosci. Nanotechnol. , vol.12 , pp. 6315
- Ng, S.M.¹ Wong, H.F.² Lau, H.K.³ Leung, C.W.⁴

101
- 84865487435
- N. Koo, M. Schmidt, T. Mollenhauer, C. Moormann, F. Schlachter, and H. Kurz, Microelectron. Eng. 97, 85 (2012).
- (2012) Microelectron. Eng. , vol.97 , pp. 85
- Koo, N.¹ Schmidt, M.² Mollenhauer, T.³ Moormann, C.⁴ Schlachter, F.⁵ Kurz, H.⁶

102
- 70349556166
- H. J. Park, M. G. Kang, and J. Guo, ACS Nano 3, 2601 (2009).
- (2009) ACS Nano , vol.3 , pp. 2601
- Park, H.J.¹ Kang, M.G.² Guo, J.³

103
- 79961213142
- J. McPhillips, C. McClatchey, T. Kelly, A. Murphy, M. P. Jonsson, G. A. Wurtz, R. J. Winfield, and R. J. Pollard, J. Phys. Chem. C 115, 15234 (2011).
- (2011) J. Phys. Chem. C , vol.115 , pp. 15234
- McPhillips, J.¹ McClatchey, C.² Kelly, T.³ Murphy, A.⁴ Jonsson, M.P.⁵ Wurtz, G.A.⁶ Winfield, R.J.⁷ Pollard, R.J.⁸

104
- 70349902976
- B. K. Lee, L. Hong, H. Y. Lee, D. Kim, and T. Kawai, Langmuir 25, 11768 (2009).
- (2009) Langmuir , vol.25 , pp. 11768
- Lee, B.K.¹ Hong, L.² Lee, H.Y.³ Kim, D.⁴ Kawai, T.⁵

105
- 69549086726
- S. H. Ahn and L. J. Guo, ACS Nano 3, 2304 (2009).
- (2009) ACS Nano , vol.3 , pp. 2304
- Ahn, S.H.¹ Guo, L.J.²

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