High volume manufacturing of nano imprint lithography produced devices: Addressing the stamp supply challenge

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7637, Issue , 2010, Pages

  Zhou, Ye ^a   Asbahi, Mohamed ^a   Luo, Gang ^a   Eriksson, Torbjörn ^a   Yamada, Shoko ^a   Krishnan, Prasanna Venkatesh ^a   Heidari, Babak ^a  

^a Box 580   (Sweden)

Author keywords

high brightness LED; High volume manufacturing; industrial manufacturing; Nano Imprint Lithography; patterned sapphire substrates; Sindre 400; stamp; stamp supply

Indexed keywords

FEATURE SIZES; HIGH BRIGHTNESS LEDS; HIGH VOLUME MANUFACTURING; INDUSTRIAL MANUFACTURING; PATTERN DENSITY; PATTERNED SAPPHIRE SUBSTRATE; STRUCTURE TYPE;

ASPECT RATIO; INDUSTRY; MANUFACTURE; SAPPHIRE; SUBSTRATES;

NANOIMPRINT LITHOGRAPHY;

EID: 77953317906     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.848332     Document Type: Conference Paper

References (6)

1. Hirai Y., Harada S., Isaka S, Kobayashi M., Tanaka Y., "Nano-Imprint Lithography using replicated mold by Ni electroforming", Japanese Journal of Applied Physics, vol. 41, pp. 4186-4189 (2002)
2. Luo J. K., Flewitt A. J., Spearing S. M., Fleck N. A. and Milne W. I.,"Young's modulus of electroplated Ni thin film for MEMS applications", Mater. Letters, vol. 58, pp. 2306-2309 (2004)
3. Haatainen T., Majander P., Riekkinen T., Ahopelto J., "Nickel stamp fabrication using step & stamp imprint lithography, Microelectron. Eng., vol. 83, pp. 948-950 (2006)
4. Hong S-H., Lee J-H., Lee H., "Fabrication of 50 nm patterned nickel stamp with hot embossing and electroforming process", Microelectron. Eng., vol. 84, pp. 977-979 (2007)
5. Lan S., Lee H., Ni J., Lee S., Lee N., "Survey on Roller type Nanoimprint Lithography (RNIL) process, International Conference on Smart Manufacturing Application, KINTEX, Gyeonggi-do, Korea (2008)
6. Keil, M., Beck M., Ling T. G. I., Graczyk M., Montelius L. and Heidari B., "Development and characterization of silane antisticking layers on nickel-based stamps designed for nanoimprint lithography. J. Vac. Sci. Techn. 23(2), 575-584 (2005)