Fabrication of metallic nanocavities by soft UV nanoimprint lithography

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 596-599

  Shi, J ^a,b   Chen, J ^a   Decanini, D ^a   Chen, Y ^b   Haghiri Gosnet, A M ^a  

^a CNRS   (France)

^b ECOLE NORMALE SUPÉRIEURE   (France)

Author keywords

Bio sensing; Nanocavity; Nanoimprint; Shadow mask evaporation

Indexed keywords

BI LAYERS; BIO-SENSING; CASTING METHODS; DARK-FIELD MICROSCOPIES; EMISSION PEAKS; GOLD NANOSTRUCTURES; HIGH ASPECT RATIOS; HIGH DENSITIES; HIGH-RESOLUTION PATTERNS; METALLIC NANOPARTICLES; NANO-OBJECTS; NANO-PILLAR ARRAYS; NANOCAVITY; NANOIMPRINT; NANOPILLARS; OBLIQUE ANGLES; RESIST LAYERS; SHADOW MASK EVAPORATION; SOFT STAMPS; UV-ASSISTED NANOIMPRINT LITHOGRAPHIES; UV-NANOIMPRINT LITHOGRAPHIES;

ASPECT RATIO; EVAPORATION; PHOTORESISTS; REACTIVE ION ETCHING; SILICONES; VAPORS;

NANOIMPRINT LITHOGRAPHY;

EID: 67349254148     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.11.052     Document Type: Article

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