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Volumn 87, Issue 5-8, 2010, Pages 963-967
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UV enhanced substrate conformal imprint lithography (UV-SCIL) technique for photonic crystals patterning in LED manufacturing
a
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Author keywords
LED; Manufacturing; NIL; Photonic crystals; SCIL; Working stamp
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Indexed keywords
CELL PHONE;
FABRICATION OF PHOTONIC CRYSTALS;
FLEXIBLE STAMP;
HIGH RESOLUTION;
HIGH THROUGHPUT;
HIGH VOLUME MANUFACTURING;
HIGH-VOLUME PRODUCTION;
IMPRINT LITHOGRAPHY;
LARGE-AREA PATTERNING;
LIGHT-EXTRACTION EFFICIENCY;
LIGHTING MARKET;
LITHOGRAPHIC PROCESS;
LOW COSTS;
LUMINOUS EFFICIENCY;
MANUFACTURING;
MASK ALIGNERS;
MICROTEC;
NANO-IMPRINT;
PHILIPS;
PORTABLE DEVICE;
RIGID STAMP;
SINGLE-STEP;
SOFT STAMPS;
UV-CURING;
WAFER LEVEL;
WORKING STAMPS;
COBALT COMPOUNDS;
CRYSTAL STRUCTURE;
EXTRACTION;
LAPTOP COMPUTERS;
LIGHT EMITTING DIODES;
MANUFACTURE;
PHOTONIC CRYSTALS;
PHYSICAL OPTICS;
SILICONES;
SUBSTRATES;
TELECOMMUNICATION EQUIPMENT;
NANOIMPRINT LITHOGRAPHY;
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EID: 76949084620
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mee.2009.11.134 Document Type: Article |
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Times cited : (138)
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References (9)
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