An innovative method for uniform pattern transfer in nanoimprint

Journal of Nanoscience and Nanotechnology

Volumn 9, Issue 7, 2009, Pages 4267-4272

  Hocheng, Hong ^a   Hsu, Wei Hsuan ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Aspect ratio; Grooves; Imprint lithography; Mold deformation; Nanoimprint; Uniformity

Indexed keywords

GROOVES; IMPRINT LITHOGRAPHY; MOLD DEFORMATION; NANOIMPRINT; UNIFORMITY;

ASPECT RATIO; DEFORMATION; MOLDS; PRESSURE DROP;

NANOIMPRINT LITHOGRAPHY;

EID: 70350316214     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2009.M44     Document Type: Conference Paper

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