Industrial applications demanding low and high resolution features realized by soft UV-NIL and hot embossing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Miller, R ^a   Glinsner, T ^a   Kreindl, G ^a   Lindner, P ^a   Wimplinger, M ^a  

^a EVGroup Inc   (Austria)

Author keywords

De embossing; Full field imprint; HE; Hot embossing; Large area imprint; Nanoimprint; Soft stamps; Soft UV NIL; Sub 100 nm features; UV NIL; Working stamps

Indexed keywords

DE-EMBOSSING; FULL-FIELD IMPRINT; HE; HOT EMBOSSING; LARGE AREA IMPRINT; NANOIMPRINT; SOFT STAMPS; SOFT UV-NIL; SUB-100 NM FEATURES; UV-NIL; WORKING STAMPS;

FABRICATION; HOT WORKING; INDUSTRIAL APPLICATIONS; MATERIALS; OXIDE MINERALS; QUARTZ;

NANOIMPRINT LITHOGRAPHY;

EID: 67149122436     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814102     Document Type: Conference Paper

References (6)

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